In this experiment, the main ion source, with a 10 cm diameter and the incident angle of 45◦, pumped in pure argon gas to generate Ar+ and sputtered the sintered high-purity SiC target.
In this experiment, the main ion source, with a 10 cm diameter and the incident angle of 45, pumped in pure argon gas to generate Ar+， flowing out on the sintered high-purity SiC target.
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