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94年老点NANOLITHOGRAPHY
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NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies Volume: Author(s): Fritz J. Hohn (auth.), M. Gentili, C. Giovannella, S. Selci (eds.) Series: NATO ASI Series 264 Periodical: Publisher: Springer Netherlands City: Year: 1994 Edition: Language: English Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).  d5aa3ffa2096a5c04919b9f4d7dc2aa1-d.jpg |
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2014-12-02 09:56
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