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[资源] 94年老点NANOLITHOGRAPHY

NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies Volume:
Author(s): Fritz J. Hohn (auth.), M. Gentili, C. Giovannella, S. Selci (eds.)
Series: NATO ASI Series 264 Periodical:
Publisher: Springer Netherlands City:
Year: 1994 Edition:
Language: English
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

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附件 1 : NANOLITHOGRAPHY__A_Borderland_between_STM,_EB,_IB,_and_X-Ray_Lithographies-Springer_Netherlands_(1994).pdf

2014-11-16 18:03:25, 7.23 M