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题目:Surface Plasmon Interference Lithography Assisted by a Fabry–Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film
期刊、卷期、时间:CHIN.PHYS. LETT. Vol. 32, No. 10 (2015) 104206

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Surface Plasmon Interference Lithography Assisted by a Fabry-Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film  

CHINESE PHYSICS LETTERS
卷: 32
期: 10
文献号: 104206

DOI: 10.1088/0256-307X/32/10/104206

出版年: OCT 2015


摘要

A surface plasmon interference lithography assisted by a Fabry-Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopatterns. The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity. The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes. The influence of the F-P cavity spacing is discussed in detail. Moreover, the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication.


关键词

KeyWords Plus:NANOLITHOGRAPHY; MODES; BEAMS

出版商

IOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND


类别 / 分类

研究方向hysics

Web of Science 类别hysics, Multidisciplinary


文献信息

文献类型:Article

语种:English

入藏号: WOS:000362944000014

ISSN: 0256-307X

eISSN: 1741-3540



期刊信息


Impact Factor (影响因子):  Journal Citation Reports®


  

其他信息

IDS 号: CT6SZ

Web of Science 核心合集中的 "引用的参考文献": 23

Web of Science 核心合集中的 "被引频次": 0
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入藏号: WOS:000362944000014
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