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ÌâÄ¿£ºSurface Plasmon Interference Lithography Assisted by a Fabry¨CPerot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film ÆÚ¿¯¡¢¾íÆÚ¡¢Ê±¼ä£ºCHIN.PHYS. LETT. Vol. 32, No. 10 (2015) 104206 |
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sunshan4379
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shanshan1212: ½ð±Ò+5, ¡ï¡ï¡ï¡ï¡ï×î¼Ñ´ð°¸, лл 2015-12-12 23:05:59
lazy½õϪ: LS-EPI+1, ¸ÐлӦÖú£¡ 2015-12-12 23:29:15
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shanshan1212: ½ð±Ò+5, ¡ï¡ï¡ï¡ï¡ï×î¼Ñ´ð°¸, лл 2015-12-12 23:05:59
lazy½õϪ: LS-EPI+1, ¸ÐлӦÖú£¡ 2015-12-12 23:29:15
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¹§Ï²£¬Òѱ»ÊÕ¼ Surface Plasmon Interference Lithography Assisted by a Fabry-Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film CHINESE PHYSICS LETTERS ¾í: 32 ÆÚ: 10 ÎÄÏ׺Å: 104206 DOI: 10.1088/0256-307X/32/10/104206 ³ö°æÄê: OCT 2015 ÕªÒª A surface plasmon interference lithography assisted by a Fabry-Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopatterns. The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity. The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes. The influence of the F-P cavity spacing is discussed in detail. Moreover, the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication. ¹Ø¼ü´Ê KeyWords Plus:NANOLITHOGRAPHY; MODES; BEAMS ³ö°æÉÌ IOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND Àà±ð / ·ÖÀà Ñо¿·½Ïò hysicsWeb of Science Àà±ð hysics, MultidisciplinaryÎÄÏ×ÐÅÏ¢ ÎÄÏ×ÀàÐÍ:Article ÓïÖÖ:English Èë²ØºÅ: WOS:000362944000014 ISSN: 0256-307X eISSN: 1741-3540 ÆÚ¿¯ÐÅÏ¢ Impact Factor (Ó°ÏìÒò×Ó): Journal Citation Reports® ÆäËûÐÅÏ¢ IDS ºÅ: CT6SZ Web of Science ºËÐĺϼ¯ÖÐµÄ "ÒýÓõIJο¼ÎÄÏ×": 23 Web of Science ºËÐĺϼ¯ÖÐµÄ "±»ÒýƵ´Î": 0 |

2Â¥2015-12-12 10:01:31
sunshan4379
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3Â¥2015-12-12 10:01:43









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