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shanshan1212

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[求助] 求助一篇论文SCI检索信息

因为学校没买权限,所以求助
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image
Jingquan Wang and Huimin Liang,J. Appl. Phys. 113, 233101 (2013 )
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小小顽主

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shanshan1212: 金币+5, ★★★★★最佳答案, 谢谢 2013-08-31 08:42:33
引用回帖:
3楼: Originally posted by shanshan1212 at 2013-08-31 07:59:30
咋没看到AU ISI号,如UT ISI:000250604100008...

入藏号: WOS:000321011700002  
这个是 收录号,也就是 SCI 号。
之所以海纳百川,是因为强大内心宽容!
4楼2013-08-31 08:10:55
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小小顽主

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gruyclewee: 检索EPI+1, 感谢应助,EPI奖励。 2013-08-31 09:50:58
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image  
作者: Wang, JQ (Wang, Jingquan)[ 1 ] ; Liang, HM (Liang, Huimin)[ 1 ]  
来源出版物: JOURNAL OF APPLIED PHYSICS  卷: 113   期: 23     文献号: 233101   DOI: 10.1063/1.4811530   出版年: JUN 21 2013  
被引频次: 0 (来自 Web of Science)  
引用的参考文献: 21      [ 查看 Related Records ]     引证关系图      
摘要: An interference lithography technique by surface-polasmon-polaritons reflecting image is suggested for fabricating large-area metal nanopatterns in this paper. This device is designed by an attenuated total reflection mode. Enhanced interference light field is formed in the resist layer coated on any thickness metal film, which will provide a nanomask on the metal film after development. If the chemical or physical etch methods are employed, the nanomask pattern can be transferred into the metal film. Calculated and analyzed results illuminate that the incident angle, the polymer interlayer thickness, and the resist layer thickness can provide large tolerances in fabrication. (C) 2013 AIP Publishing LLC.  
入藏号: WOS:000321011700002  
文献类型: Article  
语种: English  
KeyWords Plus: NANOLITHOGRAPHY; NM; RESOLUTION; MODES; BEAMS  
通讯作者地址: Wang, JQ (通讯作者) Hebei Univ, Coll Sci, Handan 056038, Peoples R China.
  增强组织信息的名称
    Hebei University  

地址:  [ 1 ] Hebei Univ, Coll Sci, Handan 056038, Peoples R China
  增强组织信息的名称
    Hebei University  

电子邮件地址: jingquanwang1212@163.com  
基金资助致谢:
基金资助机构 授权号
Natural Science Foundation of Hebei Province, China  A2013402069
A2013402081  

[显示基金资助信息][隐藏基金资助信息]   

We would like to thank Xue Wang, Hebei University of Engineering, for useful discussions. This work was supported by the Natural Science Foundation of Hebei Province, China (Grant Nos. A2013402069 and A2013402081).

出版商: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA  
Web of Science 类别: Physics, Applied  
研究方向: Physics  
IDS 号: 172NT  
ISSN: 0021-8979
之所以海纳百川,是因为强大内心宽容!
2楼2013-08-30 23:35:43
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shanshan1212

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引用回帖:
2楼: Originally posted by 小小顽主 at 2013-08-30 23:35:43
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image  
作者: Wang, JQ (Wang, Jingquan) ; Liang, HM (Liang, Huimin)  
来源出版物: JOURNA ...

咋没看到AU ISI号,如UT ISI:000250604100008
3楼2013-08-31 07:59:30
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