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ÒòΪѧУûÂòȨÏÞ£¬ËùÒÔÇóÖú Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image Jingquan Wang and Huimin Liang£¬J. Appl. Phys. 113, 233101 (2013 £© |
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3Â¥2013-08-31 07:59:30
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gruyclewee: ¼ìË÷EPI+1, ¸ÐлӦÖú£¬EPI½±Àø¡£ 2013-08-31 09:50:58
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Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image ×÷Õß: Wang, JQ (Wang, Jingquan)[ 1 ] ; Liang, HM (Liang, Huimin)[ 1 ] À´Ô´³ö°æÎï: JOURNAL OF APPLIED PHYSICS ¾í: 113 ÆÚ: 23 ÎÄÏ׺Å: 233101 DOI: 10.1063/1.4811530 ³ö°æÄê: JUN 21 2013 ±»ÒýƵ´Î: 0 (À´×Ô Web of Science) ÒýÓõIJο¼ÎÄÏ×: 21 [ ²é¿´ Related Records ] ÒýÖ¤¹ØÏµÍ¼ ÕªÒª: An interference lithography technique by surface-polasmon-polaritons reflecting image is suggested for fabricating large-area metal nanopatterns in this paper. This device is designed by an attenuated total reflection mode. Enhanced interference light field is formed in the resist layer coated on any thickness metal film, which will provide a nanomask on the metal film after development. If the chemical or physical etch methods are employed, the nanomask pattern can be transferred into the metal film. Calculated and analyzed results illuminate that the incident angle, the polymer interlayer thickness, and the resist layer thickness can provide large tolerances in fabrication. (C) 2013 AIP Publishing LLC. Èë²ØºÅ: WOS:000321011700002 ÎÄÏ×ÀàÐÍ: Article ÓïÖÖ: English KeyWords Plus: NANOLITHOGRAPHY; NM; RESOLUTION; MODES; BEAMS ͨѶ×÷ÕßµØÖ·: Wang, JQ (ͨѶ×÷Õß) Hebei Univ, Coll Sci, Handan 056038, Peoples R China. ÔöÇ¿×éÖ¯ÐÅÏ¢µÄÃû³Æ Hebei University µØÖ·: [ 1 ] Hebei Univ, Coll Sci, Handan 056038, Peoples R China ÔöÇ¿×éÖ¯ÐÅÏ¢µÄÃû³Æ Hebei University µç×ÓÓʼþµØÖ·: jingquanwang1212@163.com »ù½ð×ÊÖúÖÂл: »ù½ð×ÊÖú»ú¹¹ ÊÚȨºÅ Natural Science Foundation of Hebei Province, China A2013402069 A2013402081 [ÏÔʾ»ù½ð×ÊÖúÐÅÏ¢][Òþ²Ø»ù½ð×ÊÖúÐÅÏ¢] We would like to thank Xue Wang, Hebei University of Engineering, for useful discussions. This work was supported by the Natural Science Foundation of Hebei Province, China (Grant Nos. A2013402069 and A2013402081). ³ö°æÉÌ: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA Web of Science Àà±ð: Physics, Applied Ñо¿·½Ïò: Physics IDS ºÅ: 172NT ISSN: 0021-8979 |

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4Â¥2013-08-31 08:10:55













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