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Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image
Jingquan Wang and Huimin Liang£¬J. Appl. Phys. 113, 233101 (2013 £©
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2Â¥: Originally posted by ССÍçÖ÷ at 2013-08-30 23:35:43
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image  
×÷Õß: Wang, JQ (Wang, Jingquan) ; Liang, HM (Liang, Huimin)  
À´Ô´³ö°æÎï: JOURNA ...

զû¿´µ½AU ISIºÅ£¬ÈçUT ISI:000250604100008
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gruyclewee: ¼ìË÷EPI+1, ¸ÐлӦÖú£¬EPI½±Àø¡£ 2013-08-31 09:50:58
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image  
×÷Õß: Wang, JQ (Wang, Jingquan)[ 1 ] ; Liang, HM (Liang, Huimin)[ 1 ]  
À´Ô´³ö°æÎï: JOURNAL OF APPLIED PHYSICS  ¾í: 113   ÆÚ: 23     ÎÄÏ׺Å: 233101   DOI: 10.1063/1.4811530   ³ö°æÄê: JUN 21 2013  
±»ÒýƵ´Î: 0 (À´×Ô Web of Science)  
ÒýÓõIJο¼ÎÄÏ×: 21      [ ²é¿´ Related Records ]     ÒýÖ¤¹ØÏµÍ¼      
ÕªÒª: An interference lithography technique by surface-polasmon-polaritons reflecting image is suggested for fabricating large-area metal nanopatterns in this paper. This device is designed by an attenuated total reflection mode. Enhanced interference light field is formed in the resist layer coated on any thickness metal film, which will provide a nanomask on the metal film after development. If the chemical or physical etch methods are employed, the nanomask pattern can be transferred into the metal film. Calculated and analyzed results illuminate that the incident angle, the polymer interlayer thickness, and the resist layer thickness can provide large tolerances in fabrication. (C) 2013 AIP Publishing LLC.  
Èë²ØºÅ: WOS:000321011700002  
ÎÄÏ×ÀàÐÍ: Article  
ÓïÖÖ: English  
KeyWords Plus: NANOLITHOGRAPHY; NM; RESOLUTION; MODES; BEAMS  
ͨѶ×÷ÕßµØÖ·: Wang, JQ (ͨѶ×÷Õß) Hebei Univ, Coll Sci, Handan 056038, Peoples R China.
  ÔöÇ¿×éÖ¯ÐÅÏ¢µÄÃû³Æ
    Hebei University  

µØÖ·:  [ 1 ] Hebei Univ, Coll Sci, Handan 056038, Peoples R China
  ÔöÇ¿×éÖ¯ÐÅÏ¢µÄÃû³Æ
    Hebei University  

µç×ÓÓʼþµØÖ·: jingquanwang1212@163.com  
»ù½ð×ÊÖúÖÂл:
»ù½ð×ÊÖú»ú¹¹ ÊÚȨºÅ
Natural Science Foundation of Hebei Province, China  A2013402069
A2013402081  

[ÏÔʾ»ù½ð×ÊÖúÐÅÏ¢][Òþ²Ø»ù½ð×ÊÖúÐÅÏ¢]   

We would like to thank Xue Wang, Hebei University of Engineering, for useful discussions. This work was supported by the Natural Science Foundation of Hebei Province, China (Grant Nos. A2013402069 and A2013402081).

³ö°æÉÌ: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA  
Web of Science Àà±ð: Physics, Applied  
Ñо¿·½Ïò: Physics  
IDS ºÅ: 172NT  
ISSN: 0021-8979
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shanshan1212: ½ð±Ò+5, ¡ï¡ï¡ï¡ï¡ï×î¼Ñ´ð°¸, лл 2013-08-31 08:42:33
ÒýÓûØÌû:
3Â¥: Originally posted by shanshan1212 at 2013-08-31 07:59:30
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