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【答案】应助回帖
gruyclewee: 检索EPI+1, 感谢应助，EPI奖励。 2013-08-31 09:50:58
Interference lithography for metal nanopattern fabrication assisted by surface plasmon polaritons reflecting image
作者: Wang, JQ (Wang, Jingquan)[ 1 ] ; Liang, HM (Liang, Huimin)[ 1 ]
来源出版物: JOURNAL OF APPLIED PHYSICS 卷: 113 期: 23 文献号: 233101 DOI: 10.1063/1.4811530 出版年: JUN 21 2013
被引频次: 0 (来自 Web of Science)
引用的参考文献: 21 [ 查看 Related Records ] 引证关系图
摘要: An interference lithography technique by surface-polasmon-polaritons reflecting image is suggested for fabricating large-area metal nanopatterns in this paper. This device is designed by an attenuated total reflection mode. Enhanced interference light field is formed in the resist layer coated on any thickness metal film, which will provide a nanomask on the metal film after development. If the chemical or physical etch methods are employed, the nanomask pattern can be transferred into the metal film. Calculated and analyzed results illuminate that the incident angle, the polymer interlayer thickness, and the resist layer thickness can provide large tolerances in fabrication. (C) 2013 AIP Publishing LLC.
入藏号: WOS:000321011700002
文献类型: Article
语种: English
KeyWords Plus: NANOLITHOGRAPHY; NM; RESOLUTION; MODES; BEAMS
通讯作者地址: Wang, JQ (通讯作者) Hebei Univ, Coll Sci, Handan 056038, Peoples R China.
增强组织信息的名称
Hebei University
地址: [ 1 ] Hebei Univ, Coll Sci, Handan 056038, Peoples R China
增强组织信息的名称
Hebei University
电子邮件地址: jingquanwang1212@163.com
基金资助致谢:
基金资助机构 授权号
Natural Science Foundation of Hebei Province, China A2013402069
A2013402081
[显示基金资助信息][隐藏基金资助信息]
We would like to thank Xue Wang, Hebei University of Engineering, for useful discussions. This work was supported by the Natural Science Foundation of Hebei Province, China (Grant Nos. A2013402069 and A2013402081).
出版商: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA
Web of Science 类别: Physics, Applied
研究方向: Physics
IDS 号: 172NT
ISSN: 0021-8979 |
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