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kevinhan1

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gutenzhang

гæ (³õÈëÎÄ̳)

hi,student. i can translate english. if you need, you can touch me. my qq is 1002898840. i also can translate other languages. for example, germany, french, spain,italy,korea,thailand,indonesia,russia,etc. if you need, please touch me. thank you very much.
2Â¥2016-01-05 20:36:41
ÒÑÔÄ   ¹Ø×¢TA ¸øTA·¢ÏûÏ¢ ËÍTAºì»¨ TAµÄ»ØÌû

Î人һÐÄÒ»Òë

¾èÖú¹ó±ö (ÖøÃûдÊÖ)


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¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï ¡ï
kevinhan1: ½ð±Ò+30, ·­ÒëEPI+1, ¡ï¡ï¡ï¡ï¡ï×î¼Ñ´ð°¸ 2016-01-06 10:16:32
2.ÓÉÓÚDSi DM£¬ºöÂÔ ºÏ½ðÔªËØ À©É¢£¬Ôò°´ÕÕ Îó²î½â ¿ÉÇóµÃ ºÏ½ðÔªËØ ΪÁãʱ µÄ µÈЧ½â Ϊ
  Due to DSi DM, diffusion of alloy elements can be ignored, and thus it can obtain the equivalent solution when alloy element is zero based on error solution

3.½«ÉÏÊö½â ÔÙ»»Ëã³É ʵ¼Ê ºÏ½ðÔªËØº¬Á¿ Ìõ¼þÏ嵀 ½â£¬¼´°´Ê½£¨1£©ÓÐ
  Above solutions can be converted into the solutions under the condition of practical concentration of alloy elements, i.e. according to equation (1), it can get:

4.¿É¼û½çÃæ Á½²à SiµÄ Ũ¶È²î Óë Á½²à ºÏ½ðÔªËØÅ¨¶È²î Óйء£ÔÚ Êµ¼ÊÀ©É¢ÖУ¬ÓÉÓÚ SiµÄÀ©É¢ Ô¶¿ìÓÚ ºÏ½ðÔªËØµÄ À©É¢£¬ÔÚ¸Õ¿ªÊ¼µÄ Ò»¶Îʱ¼äÄÚ£¬½çÃæÉÏ Î¬³Ö½Ï´ó µÄSi Ũ¶È²î£¬µ«Ëæ×Å À©É¢µÄ½øÐУ¬½çÃæÉÏ ºÏ½ðÔªËØµÄ Ũ¶È²î ½«Öð½¥Ïûʧ£¬´Ó¶øSi µÄŨ¶È²î Ò²ËæÖ®Ïûʧ¡£
The concentration difference of Si between both sides of interface is related to the concentration difference of alloy elements between both sides. In practical situation, the diffusion velocity of Si is much faster than that of alloy elements, moreover in the very beginning period of diffusion, the concentration difference of Si on interface is relative big, however with the proceeding of diffusion, the concentration difference of alloy elements gradually disappears, so does the concentration difference of Si.
3Â¥2016-01-05 21:12:01
ÒÑÔÄ   ¹Ø×¢TA ¸øTA·¢ÏûÏ¢ ËÍTAºì»¨ TAµÄ»ØÌû
Ïà¹Ø°æ¿éÌø×ª ÎÒÒª¶©ÔÄÂ¥Ö÷ kevinhan1 µÄÖ÷Ìâ¸üÐÂ
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