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Although the structure of etched surface which has strong chemical activities (mailnly unsaturated bonds) can be very reactive with air to form complex surface with chemical structure, the nano layer can be removed easily by ion beam bombardment or wet etching.
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Although the etched surface which has a structure with strong chemical activities (mailnly unsaturated bonds) can react with air to form complex surface with chemical structure......
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Although the etched surface£¬a structure with strong chemical activities (mailnly unsaturated bonds)£¬can react with air to form complex surface with chemical structure......
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Although the surface structure formed during etching has strong chemical activities (mailnly unsaturated bonds) which can react with air to form complex surface with chemical structure, but this nano layer can be easily removed by ion beam bombarding or wet etching.
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4Â¥2015-05-22 09:50:55
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genhunter

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Although the etching process generated a relatively active surface structure (mainly due to unsaturated bonds), which interacts with oxygen in the air  to form a surface with complex chemical structures, however, such a layer in manometers thickness can be readily removed  by ion beam bombardment or wet etching.
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5Â¥2015-05-22 11:16:22
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Although the etching process generates a relatively active surface structure (mainly due to unsaturated bonds), which interacts with oxygen in the air  to form a surface with complex chemical structures, however, such a layer in manometers thickness can be readily removed  by ion beam bombardment or wet etching.
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6Â¥2015-05-22 11:26:08
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lben85

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Although the surface structure generated during etching has strong chemical activities (mailnly unsaturated bonds), which exposed in air can be transformed to complex surface with chemical structure, such nano layer can be easily removed by ion beam bombarding or wet etching.
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7Â¥2015-05-22 15:38:25
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