| 查看: 2754 | 回复: 56 | |||||
| 【奖励】 本帖被评价52次，作者shileijerry增加金币 41.4 个 | |||||
| 当前只显示满足指定条件的回帖，点击这里查看本话题的所有回帖 | |||||
[资源]
单层薄膜生长的在线原位观察（英文版）
|
|||||
In situ Characterization of Thin Film Growth (Woodhead Publishing in Materials) A volume in Woodhead Publishing Series in Electronic and Optical Materials About this Book Edited by:G. Koster and G. Rijnders ISBN: 978-1-84569-934-5 Book description Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques Table of Contents Download and Export checked results Other export options Front matter, Pages i-iii PDF (546 K) Entitled to full text Copyright, Page iv PDF (449 K) Entitled to full text Contributor contact details, Pages ix-xi, Gertjan Koster, Guus Rijnders, Gertjan Koster, N.J.C. Ingle, Kyle M. Shen, H. Bluhm, J.N. Hilfiker, L.V. Goncharova, P.G. Staib, V. Matias, R.H. Hammond, G. Eres, J.Z. Tischler, C.M. Rouleau, B.C. Larson, H.M. Christen, P. Zschack PDF (468 K) Entitled to full text 1 - Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth, Pages 3-28, G. Koster Abstract You are not entitled to access the full text and this document is not for purchase. 2 - Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction, Pages 29-51, N.J.C. Ingle Abstract You are not entitled to access the full text and this document is not for purchase. 3 - Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth, Pages 55-74, K.M. Shen Abstract You are not entitled to access the full text and this document is not for purchase. 4 - X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth, Pages 75-98, H. Bluhm Abstract You are not entitled to access the full text and this document is not for purchase. 5 - In situ spectroscopic ellipsometry (SE) for characterization of thin film growth, Pages 99-151, J.N. Hilfiker Abstract You are not entitled to access the full text and this document is not for purchase. 6 - In situ ion beam surface characterization of thin multicomponent films, Pages 155-179, L.V. Goncharova Abstract You are not entitled to access the full text and this document is not for purchase. 7 - Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth, Pages 180-211, P.G. Staib Abstract You are not entitled to access the full text and this document is not for purchase. 8 - In situ deposition vapor monitoring, Pages 212-238, V. Matias, R.H. Hammond Abstract You are not entitled to access the full text and this document is not for purchase. 9 - Real-time studies of epitaxial film growth using surface X-ray diffraction (SXRD), Pages 239-273, G. Eres, J.Z. Tischler, C.M. Rouleau, B.C. Larson, H.M. Christen, P. Zschack Abstract You are not entitled to access the full text and this document is not for purchase. Index, Pages 274-282 First page PDF |
回复此楼» 本帖附件资源列表
-
欢迎监督和反馈：小木虫仅提供交流平台，不对该内容负责。
本内容由用户自主发布，如果其内容涉及到知识产权问题，其责任在于用户本人，如对版权有异议，请联系邮箱：xiaomuchong@tal.com - 附件 1 : In_situ_Characterization_of_Thin_Film_Growth_(Woodhead_Publishing_in_Materials).pdf
2014-12-09 11:11:40, 10.01 M
» 收录本帖的淘帖专辑推荐
 专业书籍（外文版）WM | 物理化学材料类书籍 | 纳米材料+光电子学 |
» 猜你喜欢
求助一篇MEMS散热器件文献
已经有0人回复
-
材化专业SCI论文（职称评定）
已经有0人回复
-
无机化学论文润色/翻译怎么收费?
已经有113人回复
-
材料化学专业SCI论文（职称评定）
已经有0人回复
» 本主题相关价值贴推荐，对您同样有帮助:
- 关于安徽省2015年度自然科学基金拟立项项目的公示
已经有20人回复
- 石墨烯用旋涂怎么样才能让玻璃上有一层膜
已经有52人回复
- 2014年度浙江省自然科学基金拟资助项目清单
已经有14人回复
- 做原位漫反射薄膜样品的制样和装填
已经有4人回复
- 国内哪些学校的TEM可以原位观察铁电薄膜中畴
已经有12人回复
- 原位还原石墨烯与PVA混合成膜后，膜表面有很多气泡，怎么能避免？
已经有5人回复
- AFM能用来做溶液样本中的纳米颗粒的表征吗
已经有22人回复
- 透射电镜观察细胞样品
已经有16人回复
19楼2014-12-11 07:52:27
简单回复
2014-12-09 14:39
回复
五星好评 顶一下，感谢分享！
lwg33楼
2014-12-09 16:58
回复
五星好评 顶一下，感谢分享！
wtiger4楼
2014-12-09 18:35
回复
五星好评 顶一下，感谢分享！
adzxf5楼
2014-12-09 19:50
回复
五星好评 顶一下，感谢分享！
sendysan6楼
2014-12-09 22:32
回复
五星好评 顶一下，感谢分享！
小偷爸爸7楼
2014-12-09 23:31
回复
五星好评 顶一下，感谢分享！
Jason9198楼
2014-12-10 00:10
回复
五星好评 顶一下，感谢分享！
VDFEPI9楼
2014-12-10 08:47
回复
五星好评 顶一下，感谢分享！
qing10810楼
2014-12-10 10:36
回复
五星好评 顶一下，感谢分享！
大笨虾11楼
2014-12-10 10:56
回复
五星好评 顶一下，感谢分享！
xwj00712楼
2014-12-10 11:23
回复
五星好评 顶一下，感谢分享！
cfx1985052813楼
2014-12-10 13:26
回复
五星好评 顶一下，感谢分享！
焊工14楼
2014-12-10 13:54
回复
三星好评 顶一下，感谢分享！
25