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[资源] 单层薄膜生长的在线原位观察（英文版）

In situ Characterization of Thin Film Growth (Woodhead Publishing in Materials)

A volume in Woodhead Publishing Series in Electronic and Optical Materials
About this Book
Edited by:G. Koster and G. Rijnders
ISBN: 978-1-84569-934-5

Book description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.
Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.
With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area.
Chapters review electron diffraction techniques, including the methodology for observations and measurements
Discusses the principles and applications of photoemission techniques
Examines alternative in situ characterisation techniques
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Front matter, Pages i-iii
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Copyright, Page iv
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Contributor contact details, Pages ix-xi, Gertjan Koster, Guus Rijnders, Gertjan Koster, N.J.C. Ingle, Kyle M. Shen, H. Bluhm, J.N. Hilfiker, L.V. Goncharova, P.G. Staib, V. Matias, R.H. Hammond, G. Eres, J.Z. Tischler, C.M. Rouleau, B.C. Larson, H.M. Christen, P. Zschack
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1 - Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth, Pages 3-28, G. Koster
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2 - Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction, Pages 29-51, N.J.C. Ingle
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3 - Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth, Pages 55-74, K.M. Shen
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4 - X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth, Pages 75-98, H. Bluhm
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5 - In situ spectroscopic ellipsometry (SE) for characterization of thin film growth, Pages 99-151, J.N. Hilfiker
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6 - In situ ion beam surface characterization of thin multicomponent films, Pages 155-179, L.V. Goncharova
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7 - Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth, Pages 180-211, P.G. Staib
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8 - In situ deposition vapor monitoring, Pages 212-238, V. Matias, R.H. Hammond
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9 - Real-time studies of epitaxial film growth using surface X-ray diffraction (SXRD), Pages 239-273, G. Eres, J.Z. Tischler, C.M. Rouleau, B.C. Larson, H.M. Christen, P. Zschack
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Index, Pages 274-282
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2014-12-09 11:11:40, 10.01 M