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薄膜及其表面分析技术（Surface and Thin Film Analysis）
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Surface and Thin Film Analysis Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry.From a Review of the First Edition (edited by Bubert and Jenett)"... a useful resource..."(Journal of the American Chemical Society) 目录如下： Contents Preface to the First Edition XVII Preface to the Second Edition XIX List of Contributors XXI 1 Introduction 1 John C. Rivière and Henning Bubert Part One Electron Detection 7 2 X-Ray Photoelectron Spectroscopy (XPS) 9 Henning Bubert, John C. Rivière, and Wolfgang S.M. Werner 2.1 Principles 9 2.2 Instrumentation 12 2.2.1 Vacuum Requirements 12 2.2.2 X-Ray Sources 13 2.2.3 Synchrotron Radiation 16 2.2.4 Electron Energy Analyzers 16 2.2.5 Spatial Resolution 18 2.3 Spectral Information and Chemical Shifts 19 2.4 Quantifi cation, Depth Profi ling, and Imaging 21 2.4.1 Quantifi cation 21 2.4.2 Depth Profi ling 23 2.4.3 Imaging 26 2.5 The Auger Parameter 27 2.6 Applications 28 2.6.1 Catalysis 28 2.6.2 Polymers 30 2.6.3 Corrosion and Passivation 31 2.6.4 Adhesion 32 2.6.5 Superconductors 34 2.6.6 Semiconductors 35 2.7 Ultraviolet Photoelectron Spectroscopy (UPS) 38 References 39 3 Auger Electron Spectroscopy (AES) 43 Henning Bubert, John C. Rivière, and Wolfgang S.M. Werner 3.1 Principles 43 3.2 Instrumentation 44 3.2.1 Vacuum Requirements 44 3.2.2 Electron Sources 44 3.2.3 Electron-Energy Analyzers 45 3.3 Spectral Information 47 3.4 Quantifi cation and Depth Profi ling 51 3.4.1 Quantifi cation 51 3.4.2 Depth Profi ling 53 3.5 Applications 54 3.5.1 Grain Boundary Segregation 54 3.5.2 Semiconductor Technology 56 3.5.3 Thin Films and Interfaces 58 3.5.4 Surface Segregation 58 3.6 Scanning Auger Microscopy (SAM) 61 References 64 4 Electron Energy-Loss Spectroscopy (EELS) and Energy-Filtering Transmission Electron Microscopy (EFTEM) 67 Reinhard Schneider 4.1 Principles 68 4.2 Instrumentation 70 4.3 Qualitative Spectral Information 72 4.3.1 Low-Loss Excitations 74 4.3.2 Ionization Losses 77 4.3.3 Fine Structures 79 4.4 Quantifi cation 83 4.5 Imaging of Element Distribution 85 4.6 Summary 88 References 89 5 Low-Energy Electron Diffraction (LEED) 93 Georg Held 5.1 Principles and History 93 5.2 Instrumentation 94 5.3 Qualitative Information 96 5.3.1 LEED Pattern 96 5.3.2 Spot Profi le Analysis 100 5.3.3 Applications and Restrictions 100 5.4 Quantitative Structural Information 101 5.4.1 Principles 101 5.4.2 Experimental Techniques 102 5.4.3 Computer Programs 104 5.4.4 Applications and Restrictions 105 5.5 Low-Energy Electron Microscopy 106 5.5.1 Principles of Operation 106 5.5.2 Applications and Restrictions 108 References 108 6 Other Electron-Detecting Techniques 111 John C. Rivière 6.1 Ion (Excited) Auger Electron Spectroscopy (IAES) 111 6.2 Ion Neutralization Spectroscopy (INS) 111 6.3 Inelastic Electron Tunneling Spectroscopy (IETS) 112 Reference 113 Part Two Ion Detection 115 7 Static Secondary Ion Mass Spectrometry (SSIMS) 117 Heinrich F. Arlinghaus 7.1 Principles 117 7.2 Instrumentation 119 7.2.1 Ion Sources 119 7.2.2 Mass Analyzers 120 7.2.2.1 Quadrupole Mass Spectrometers 120 7.2.2.2 Time-of-Flight Mass Spectrometry (TOF-MS) 121 7.3 Quantifi cation 123 7.4 Spectral Information 125 7.5 Applications 127 7.5.1 Oxide Films 128 7.5.2 Interfaces 128 7.5.3 Polymers 131 7.5.4 Biosensors 133 7.5.5 Surface Reactions 134 7.5.6 Imaging 135 7.5.7 Ultra-Shallow Depth Profi ling 137 References 138 8 Dynamic Secondary Ion Mass Spectrometry (SIMS) 141 Herbert Hutter 8.1 Principles 141 8.1.1 Compensation of Preferential Sputtering 141 8.1.2 Atomic Mixing 142 8.1.3 Implantation of Primary Ions 142 8.1.4 Crater Bottom Roughening 142 8.1.5 Sputter-Induced Roughness 142 8.1.6 Charging Effects 142 8.2 Instrumentation 143 8.2.1 Ion Sources 143 8.2.1.1 Duoplasmatron 144 8.2.2 Mass Analyzer 144 8.2.2.1 Magnetic Sector Field 144 8.2.2.2 Detector 145 8.3 Spectral Information 146 8.4 Quantifi cation 147 8.4.1 Relative Sensitivity Factors 147 8.4.2 Implantation Standards 147 8.4.3 Metal Ceside (MCs+) Ions 148 8.4.4 Theoretical Models 148 8.4.4.1 Electron Tunneling Model 148 8.4.4.2 Broken Bond Model 148 8.4.4.3 Local Thermodynamic Equilibrium LTE 148 8.5 Mass Spectra 149 8.6 Depth Profi les 149 8.6.1 Dual-Beam Technique for TOF-SIMS Instruments 152 8.6.2 Molecular Depth Profi les 152 8.7 Imaging 152 8.7.1 Scanning SIMS 152 8.7.2 Direct Imaging Mode 153 8.8 Three-Dimensional (3-D)-SIMS 154 8.9 Applications 156 8.9.1 Implantation Profi les 156 8.9.2 Layer Analysis 157 8.9.3 3-D Trace Element Distribution 158 References 159 9 Electron-Impact (EI) Secondary Neutral Mass Spectrometry (SNMS) 161 Michael Kopnarski and Holger Jenett 9.1 Introduction 161 9.2 General Principles of SNMS 162 9.2.1 Postionization via Electron Impact 163 9.2.2 Suppression of Residual Gas and Secondary Ions 164 9.3 Instrumentation and Methods 166 9.3.1 Electron Beam SNMS 166 9.3.2 Plasma SNMS 167 9.4 Spectral Information and Quantifi cation 170 9.5 Element Depth Profi ling 172 9.6 Applications 174 References 175 10 Laser Secondary Neutral Mass Spectrometry (Laser-SNMS) 179 Heinrich F. Arlinghaus 10.1 Principles 179 10.1.1 Nonresonant Laser-SNMS 179 10.1.2 Resonant Laser-SNMS 179 10.1.3 Experimental Set-Up 180 10.1.4 Ionization Schemes 181 10.2 Instrumentation 182 10.3 Spectral Information 183 10.4 Quantifi cation 183 10.5 Applications 184 10.5.1 Nonresonant Laser-SNMS 184 10.5.2 Resonant Laser-SNMS 186 References 189 11 Rutherford Backscattering Spectroscopy (RBS) 191 Leopold Palmetshofer 11.1 Introduction 191 11.2 Principles 191 11.3 Instrumentation 194 11.4 Spectral Information 194 11.5 Quantifi cation 196 11.6 Figures of Merit 197 11.6.1 Mass Resolution 197 11.6.2 Sensitivity 198 11.6.3 Depth Resolution 198 11.6.4 Accuracy 198 11.7 Applications 198 11.8 Related Techniques 201 References 201 12 Low-Energy Ion Scattering (LEIS) 203 Peter Bauer 12.1 Principles 203 12.2 Instrumentation 206 12.3 LEIS Information 208 12.3.1 Energy Information 208 12.3.2 Yield Information 208 12.4 Quantifi cation 211 12.5 Applications of LEIS 211 References 214 13 Elastic Recoil Detection Analysis (ERDA) 217 Oswald Benka 13.1 Introduction 217 13.2 Fundamentals 218 13.3 Particle Identifi cation Methods 220 13.4 Equipment 222 13.5 Data Analysis 223 13.6 Sensitivity and Depth Resolution 223 13.7 Applications 224 References 226 14 Nuclear Reaction Analysis (NRA) 229 Oswald Benka 14.1 Introduction 229 14.2 Principles 231 14.3 Equipment and Depth Resolution 232 14.4 Applications 234 References 236 15 Field Ion Microscopy (FIM) and Atom Probe (AP) 237 Yuri Suchorski and Wolfgang Drachsel 15.1 Introduction 237 15.2 Principles and Instrumentation 239 15.2.1 Field Ion Microscopy 239 15.2.2 Time-of-Flight Atom Probe Techniques 242 15.2.3 Field Ion Appearance Energy Spectroscopy 246 15.3 Applications 248 15.3.1 FIM Applications 248 15.3.1.1 FIM in Catalysis 248 15.3.1.2 Fluctuation-Induced Effects 249 15.3.2 Applications of AP Techniques 252 15.3.2.1 Applications of TOF-AP Techniques 252 15.3.2.2 PFDMS Applications 254 15.3.2.3 FIAES Applications 255 References 257 16 Other Ion-Detecting Techniques 261 John C. Rivière 16.1 Desorption Methods 261 16.1.1 Electron-Stimulated Desorption (ESD) and ESD Ion Angular Distribution (ESDIAD) 261 16.1.2 Thermal Desorption Spectroscopy (TDS) 262 16.2 Glow-Discharge Mass Spectroscopy (GD-MS) 263 16.3 Fast-Atom Bombardment Mass Spectroscopy (FABMS) 263 References 264 Part Three Photon Detection 265 17 Total-Refl ection X-Ray Fluorescence (TXRF) Analysis 267 Laszlo Fabry, Siegfried Pahlke, and Burkhard Beckhoff 17.1 Principles 267 17.2 Instrumentation 269 17.3 Spectral Information 275 17.4 Quantifi cation 276 17.5 Applications 277 17.5.1 Particulate and Film-Type Surface Contamination 277 17.5.2 Semiconductors 278 17.5.2.1 Synchrotron Radiation-Based Techniques 280 17.5.2.2 Depth Profi ling by TXRF and by Grazing Incidence XRF (GIXRF) for the Characterization of Nanolayers and Ultra-Shallow Junctions 283 17.5.2.3 Vapor-Phase Decomposition (VPD) and Droplet Collection 285 17.5.2.4 Vapor-Phase Treatment (VPT) and Total Refl ection X-Ray Fluorescence Analysis 287 References 288 18 Energy-Dispersive X-Ray Spectroscopy (EDXS) 293 Reinhard Schneider 18.1 Principles 293 18.2 Practical Aspects of X-Ray Microanalysis and Instrumentation 295 18.3 Qualitative Spectral Information 303 18.4 Quantifi cation 304 18.5 Imaging of Element Distribution 306 18.6 Summary 308 References 309 19 Grazing Incidence X-Ray Methods for Near-Surface Structural Studies 311 P. Neil Gibson 19.1 Principles 311 19.1.1 The Grazing Incidence X-Ray Geometry 312 19.1.2 Grazing Incidence X-Ray Refl ectivity (GXRR) 314 19.1.3 Glancing Angle X-Ray Diffraction 314 19.1.4 Refl EXAFS 316 19.2 Experimental Techniques and Data Analysis 317 19.2.1 Grazing Incidence X-Ray Refl ectivity (GXRR) 318 19.2.2 Grazing Incidence Asymmetric Bragg (GIAB) Diffraction 319 19.3 Applications 321 19.3.1 Grazing Incidence X-Ray Refl ectivity (GXRR) 321 19.3.2 Grazing Incidence Asymmetric Bragg (GIAB) Diffraction 323 19.3.3 Grazing Incidence X-Ray Scattering (GIXS) 324 19.3.4 Refl EXAFS 325 References 326 20 Glow Discharge Optical Emission Spectroscopy (GD-OES) 329 Volker Hoffmann and Alfred Quentmeier 20.1 Principles 329 20.2 Instrumentation 330 20.2.1 Glow Discharge Sources 330 20.2.2 Spectrometer 334 20.2.3 Signal Acquisition 334 20.3 Spectral Information 335 20.4 Quantifi cation 336 20.5 Depth Profi ling 337 20.6 Applications 339 20.6.1 dc GD Sources 340 20.6.2 rf GD Sources 340 References 342 21 Surface Analysis by Laser Ablation 345 Roland Hergenröder and Michail Bolshov 21.1 Introduction 345 21.2 Instrumentation 346 21.2.1 Types of Laser 346 21.2.2 Different Schemes of Laser Ablation 347 21.3 Depth Profi ling 348 21.4 Near-Field Ablation 354 21.5 Conclusion 354 References 355 22 Ion Beam Spectrochemical Analysis (IBSCA) 357 Volker Rupertus 22.1 Principles 357 22.2 Instrumentation 358 22.3 Spectral and Analytical Information 360 22.4 Quantitative Analysis by IBSCA 361 22.5 Applications 363 References 366 23 Refl ection Absorption IR Spectroscopy (RAIRS) 367 Karsten Hinrichs 23.1 Instrumentation 367 23.2 Principles 368 23.3 Applications 369 23.3.1 RAIRS 369 23.3.2 ATR and SEIRA 372 23.4 Related Techniques 374 References 374 24 Surface Raman Spectroscopy 377 Wieland Hill and Bernhard Lendl 24.1 Principles 377 24.2 Surface-Enhanced Raman Scattering (SERS) 378 24.3 Instrumentation 380 24.4 Spectral Information 382 24.5 Quantifi cation 383 24.6 Applications 383 24.6.1 Unenhanced Raman Spectroscopy at Smooth Surfaces 383 24.6.2 Porous Materials 385 24.6.3 Surface-Enhanced Raman Spectroscopy (SERS) 386 24.6.4 Near-Field Raman Spectroscopy 387 24.7 Nonlinear Optical Spectroscopy 387 24.7.1 Sum Frequency Generation (SFG) Spectroscopy 387 24.7.2 Coherent Anti-Stokes Raman Scattering (CARS) 389 24.7.3 Stimulated Femtosecond Raman Scattering (SFRS) 389 24.7.4 Spatially Offset Raman Spectroscopy (SORS) 390 References 390 25 UV-VIS-IR Ellipsometry (ELL) 393 Bernd Gruska and Karsten Hinrichs 25.1 Principles 393 25.2 Instrumentation 395 25.3 Applications 398 25.3.1 UV-Vis-NIR Spectral Region 398 25.3.2 Infrared Ellipsometry 400 References 405 26 Sum Frequency Generation (SFG) Spectroscopy 407 Günther Rupprechter and Athula Bandara 26.1 Introduction to SFG Spectroscopy 407 26.2 SFG Theory 410 26.2.1 SFG Signal Intensity and Lineshape 412 26.2.2 Determining the Number Density of Molecules from SFG Signal Intensity 413 26.3 SFG Instrumentation and Operation Modes 414 26.4 Applications of SFG Spectroscopy and Selected Case Studies 417 26.4.1 SFG Spectroscopy on Solid Surfaces and Solid–Gas Interfaces 417 26.4.1.1 SFG Spectroscopy under UHV Conditions 417 26.4.1.2 Polarization-Dependent SFG Spectroscopy 419 26.4.1.3 SFG Spectroscopy under Near-Atmospheric Gas Pressure 420 26.4.1.4 SFG Spectroscopy on Supported Metal Nanoparticles 421 26.4.1.5 Time-Resolved (Pump-Probe) and Broadband SFG Spectroscopy 423 26.4.1.6 SFG Spectroscopy on Colloidal Nanoparticles and Powder Materials 427 26.4.2 SFG Spectroscopy on Solid–Liquid Interfaces 428 26.4.3 SFG Spectroscopy on Polymer and Biomaterial Interfaces 428 26.4.4 SFG Spectroscopy at Liquid–Gas and Liquid–Liquid Interfaces 429 26.5 Conclusion 430 References 430 27 Other Photon-Detecting Techniques 437 John C. Rivière 27.1 Appearance Potential Methods 437 27.1.1 Soft X-Ray Appearance Potential Spectroscopy (SXAPS) 437 27.2 Inverse Photoemission Spectroscopy (IPES) and Bremsstrahlung Isochromat Spectroscopy (BIS) 437 Part Four Scanning Probe Microscopy 439 28 Introduction 441 Gernot Friedbacher References 442 29 Atomic Force Microscopy (AFM) 443 Gernot Friedbacher 29.1 Principles 443 29.2 Further Modes of AFM Operation 446 29.2.1 Friction Force Microscopy (FFM) 446 29.2.2 Young’s Modulus Microscopy (YMM) or Force Modulation Microscopy (FMM) 447 29.2.3 Phase Imaging 447 29.2.4 Force–Distance Curve Measurements 447 29.2.5 Pulsed Force Mode AFM 448 29.2.6 Harmonic Imaging and Torsional Resonance Mode 449 29.3 Instrumentation 452 29.4 Applications 455 References 462 30 Scanning Tunneling Microscopy (STM) 465 Gernot Friedbacher 30.1 Principles 465 30.2 Instrumentation 467 30.3 Lateral and Spectroscopic Information 468 30.4 Applications 470 References 479 31 Scanning Near-Field Optical Microscopy (SNOM) 481 Marc Richter and Volker Deckert 31.1 Introduction 481 31.2 Instrumentation and Operation 482 31.2.1 Basic Set-Up 482 31.2.2 Variations of SNOM 483 31.2.3 Scanning and Feedback Techniques 484 31.2.4 Tip Fabrication 485 31.2.4.1 Taper Formation 486 31.2.4.2 Coating Deposition and Aperture Formation 486 31.2.4.3 Advanced Tip Fabrication 487 31.3 SNOM Applications 488 31.3.1 Fluorescence 488 31.3.2 Near-Field Raman Spectroscopy 490 31.3.3 SNOM-IR-Spectroscopy 492 31.4 Outlook 493 References 493 Appendices 499 Appendix A Summary and Comparison of Techniques 501 Appendix B Surface and Thin-Film Analytical Equipment Suppliers 507 Index 519[ Last edited by shileijerry on 2014-11-26 at 15:43 ] |
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