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liguo.920

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[求助] 电化学阻抗谱分析求助,急啊!

本人最近投了一篇JSEL杂志,一位审稿人对文章中阻抗谱分析部分返回的意见如下:
Unfortunately, the discussion of impedance measurements is always unsatisfaying.
There is a fundamental misunderstanding about the concept of constant phase element (CPE). The definition given by Eq.2 is correct, but Cdl is never in unit of Farad but in Fs^n, because pulsation w is in s^-1, and w^n in s^-n!
Then comparing Cdl values corresponding to different values of n is totally meaningless. As a consequence, Table 1 is not acceptable in the present form for the following reasons:
1/ Cdl is not in mF and cannot be identified as the double layer capacitance;
2/ n values are of the order of 0.7 suggesting the layer to be porous: the CPE representation leads to a good fit but remains purely formal without direct information about physical quantities. More sophisticated impedance models could be considered to get information on interfacial quantities of interest.
3/ The Cf parameter with so high values is hardly attribuable to an actual film capacitance. Knowing that the dielectric permittivity of tin oxide turns around 10, a 1 m thick layer would have a 10 nF/cm2 capacitance, and 10  F/cm2 if 1 nm thick only! Never in mF.
In conclusion, frequency analysis of impedance data according to the electrical circuit in Fig.5 is purely formal, with the consequence that the parameters in Table 1 have no physical meaning.
看到审稿意见我顿时懵了,我对这么专业的EIS分析实在是不懂啊。本人做的是二氧化锡电极材料,在钛基底表面涂覆一中间层后又涂覆二氧化锡表面层。有没有哪位专业人士能帮忙分析一下,因有些具体数据不方便上传,可单独联系。万分感谢!!!急啊!
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