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[求助]
求助关于XPS溅射掉表面杂质对薄膜成分的影响
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在下投的某杂志文章。中间有一段关于XPS的，我开离子枪溅射了10秒钟打掉表面的杂质，其间开了中和枪，然后测的下面的成分和价态。审稿人意见如下： Ar-ion sputtering of oxides in general results in preferential sputtering, often reducing the oxygen content, changing stoichiometry, and can renders the XPS difficult to interpret. What were the details of the sputtering currents, time, energy and do the authors think that their data regarding oxidation states are reliable? 现在求助一下XPS高手，开了中和枪以后溅射对成分和价态或者化学偏移的影响还会比较大么？我该如何回答。谢谢 |
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