| 查看: 1452 | 回复: 52 | |||||||
[交流]
【2012-8-15】The 1st International Conference on ALD Applications & 2nd Chin
|
|||||||
https://mse.fudan.edu.cn/nanomembrane/c-ald/ The 1st International Conference on ALD Applications & 2nd China ALD conference will be a two-day meeting, dedicated to the fundamental, materials, and applications of Atomic Layer Deposition (ALD) technology. It will be held in Shanghai, China, from October 15 to 16, 2012. Following the success of the 1st China ALD Scientific Meeting in 2010, the 2nd China ALD 2012 conference will feature plenary sessions, poster sessions and an industrial exhibition. Papers submitted by students will be eligible for the "Best Student PaperAwards". Atomic Layer Deposition is applied in numerous advanced technologies including microelectronics, nanotechnology, MEMS/NEMS, and green energy technology that require precise control of film properties in thickness, uniformity, and comformality etc. In microelectronics, ALD has established its applications in e.g. high dielectric constant (high-k) films for MOS devices, metal nanocrystals for memory devices, and ultrathin diffusion barriers for Cu interconnects. ALD is also receiving great attention for its potential application in solar energy, organic electronics, catalysis, micro-systems and biological applications. A unique attribute of ALD is the use of sequential self-limiting surface reactions to achieve conformal films with sub-monolayer thickness control. This conference will cover all aspects of ALD: * ALD Precursors and Precursor Design * Simulation, Modeling, and Theory of ALD * ALD Surface Chemistry * Surface Preparation for ALD * Initiation of ALD Growth * Patterned and Selective Area ALD * In-situ Monitoring and Analysis * Radical, Plasma and Other Energy-Enhanced ALD Methods * Equipment and Manufacturing * Applications of ALD for Microelectronics and Nanotechnology * ALD for MEMS * ALD for Catalytic, Photovoltaic, Optical, Magnetic Materials * Characterization of ALD Coatings * Devices Formed Using ALD Materials IMPORTANT DATES August 15, 2012—Abstract Submission Ends September 20, 2012—Preregistration Opens Please submit your abstract for Oral or Poster presentation to the Organization Committee ORGANIZING COMMITTEE CO-CHAIRS Prof. Shi-Jin Ding, Fudan University (sjding@fudan.edu.cn) Prof. Yongfeng Mei, Fudan University (yfm@fudan.edu.cn) Mr. Stephen Liu (CEO), Honoprof Ltd. CONFERENCE COMMITTEE & INVITED SPEAKERS Prof. DavidWei Zhang, Fudan University (Co-chair) Dr. Wei-Min Li, Picosun Ltd. (Co-chair) Prof. Mikko Ritala, University of Helsinki Prof. Peide Ye, Purdue University Prof. Markku Leskela, University of Helsinki Prof. Minghwei Hong, National Taiwan University Prof. RobertWallace, University of Texas at Dallas Prof. Mato Knez, Nanoscience Cooperative Research Center, Spain Prof. Hongjin Fan, Nanyang Technological University, Singapore PROCEEDING AND FULL PAPER: Full contributed papers will be peer reviewed and published in a special issue Nanoscale Research Letters (2011 impact factor: 2.557). VENUE AND ACCOMMODATION: Fuxuan Hotel, Guoding Road 400, Shanghai, China Tel.: +86-(0)21-55589518 https://mse.fudan.edu.cn/nanomembrane/c-ald/ [ Last edited by gshuang on 2012-7-5 at 15:17 ] |
回复此楼» 猜你喜欢
售SCI一区文章，我:8O5.5.1.O5.4,科目全,可伽急
已经有4人回复
-
售SCI一区文章，我:8.O.55.1.O.54,科目齐全,可伽急
已经有4人回复
-
售SCI文章，我:8O.5.5.1O.54,科目全,可十急
已经有5人回复
-
售SCI一区T0P文章，我:8O.55.1.O.54,科目全,可伽急
已经有5人回复
-
售SCI文章，我:8O.5.5.1O.54,科目全,可十急
已经有5人回复
-
售SCI一区文章，我:8.O.551.O.5.4,科目全,可伽急
已经有3人回复
-
怎么看青基中了没有啊
已经有6人回复
-
国社科又开始会评了，不知道这次命运如何
已经有11人回复
-
有多少人是今天查系统知道结果的？
已经有19人回复
-
基金未中，这种答复是模板吗？
已经有7人回复
好累 30楼2012-07-05 16:16:34
简单回复
SJK2楼
2012-07-05 15:13
回复
gshuang(金币+1): 谢谢参与
中国小挺3楼
2012-07-05 15:18
回复
gshuang(金币+1): 谢谢参与
2012-07-05 15:18
回复
gshuang(金币+1): 谢谢参与
中国小挺5楼
2012-07-05 15:18
回复
gshuang(金币+1): 谢谢参与
bai1236楼
2012-07-05 15:19
回复
gshuang(金币+1): 谢谢参与
bai1237楼
2012-07-05 15:19
回复
gshuang(金币+1): 谢谢参与
2012-07-05 15:23
回复
gshuang(金币+1): 谢谢参与
2012-07-05 15:23
回复
gshuang(金币+1): 谢谢参与
jeehee10楼
2012-07-05 15:24
回复
gshuang(金币+1): 谢谢参与
TonyGeN11楼
2012-07-05 15:30
回复
gshuang(金币+1): 谢谢参与
jxhl.hust12楼
2012-07-05 15:34
回复
gshuang(金币+1): 谢谢参与
jxhl.hust13楼
2012-07-05 15:35
回复
gshuang(金币+1): 谢谢参与
zhang731114楼
2012-07-05 15:36
回复
gshuang(金币+1): 谢谢参与
smiletian15楼
2012-07-05 15:38
回复
gshuang(金币+1): 谢谢参与
hzlian16楼
2012-07-05 15:39
回复
gshuang(金币+1): 谢谢参与
bestlike17楼
2012-07-05 15:40
回复
gshuang(金币+1): 谢谢参与
icebergwu18楼
2012-07-05 15:45
回复
gshuang(金币+1): 谢谢参与
neu23419楼
2012-07-05 15:45
回复
gshuang(金币+1): 谢谢参与
neu23420楼
2012-07-05 15:45
回复
gshuang(金币+1): 谢谢参与
sush201221楼
2012-07-05 15:59
回复
gshuang(金币+1): 谢谢参与
sush201222楼
2012-07-05 15:59
回复
gshuang(金币+1): 谢谢参与
I_Gabriel23楼
2012-07-05 16:00
回复
gshuang(金币+1): 谢谢参与
木米月厷24楼
2012-07-05 16:08
回复
gshuang(金币+1): 谢谢参与
木米月厷25楼
2012-07-05 16:09
回复
gshuang(金币+1): 谢谢参与
wanjiang0926楼
2012-07-05 16:11
回复
gshuang(金币+1): 谢谢参与
wanjiang0927楼
2012-07-05 16:12
回复
gshuang(金币+1): 谢谢参与
僵尸之吻28楼
2012-07-05 16:12
回复
gshuang(金币+1): 谢谢参与
w9w9w929楼
2012-07-05 16:14
回复
gshuang(金币+1): 谢谢参与
flyxu31楼
2012-07-05 16:18
回复
gshuang(金币+1): 谢谢参与
醇棠牧32楼
2012-07-05 16:27
回复
gshuang(金币+1): 谢谢参与
spc0833楼
2012-07-05 16:32
回复
gshuang(金币+1): 谢谢参与
spc0834楼
2012-07-05 16:32
回复
gshuang(金币+1): 谢谢参与
zhengkning35楼
2012-07-05 16:33
回复
gshuang(金币+1): 谢谢参与
2000250436楼
2012-07-05 16:33
回复
gshuang(金币+1): 谢谢参与
高安李敏37楼
2012-07-05 16:35
回复
gshuang(金币+1): 谢谢参与
nwxjh38楼
2012-07-05 16:41
回复
gshuang(金币+1): 谢谢参与
nwxjh39楼
2012-07-05 16:41
回复
gshuang(金币+1): 谢谢参与
AnnF40楼
2012-07-05 16:49
回复
gshuang(金币+1): 谢谢参与
AnnF41楼
2012-07-05 16:50
回复
gshuang(金币+1): 谢谢参与
魔王@西域42楼
2012-07-05 16:59
回复
gshuang(金币+1): 谢谢参与
userhung43楼
2012-07-05 17:25
回复
gshuang(金币+1): 谢谢参与
userhung44楼
2012-07-05 17:25
回复
gshuang(金币+1): 谢谢参与
su-b0845楼
2012-07-05 17:27
回复
gshuang(金币+1): 谢谢参与
su-b0846楼
2012-07-05 17:27
回复
gshuang(金币+1): 谢谢参与
yingying158847楼
2012-07-05 17:34
回复
gshuang(金币+1): 谢谢参与
祝福!!
勇敢的心st48楼
2012-07-05 18:00
回复
gshuang(金币+1): 谢谢参与
勇敢的心st49楼
2012-07-05 18:01
回复
gshuang(金币+1): 谢谢参与
__潇潇洒洒50楼
2012-07-05 18:04
回复
gshuang(金币+1): 谢谢参与
投票:
10