| 查看: 1000 | 回复: 2 | ||
| 本帖产生 1 个 翻译EPI ，点击这里进行查看 | ||
| 当前只显示满足指定条件的回帖，点击这里查看本话题的所有回帖 | ||
295435736金虫 (小有名气)
|
[求助]
请教一段话的翻译---中翻英
|
|
| 从图5可以看出极板间SiH3摩尔分数呈非均匀性分布，即在衬底中心处浓度较高，而在边缘处浓度较低。为了对沉积过程中复杂的物理和化学过程进行简化，本文将反应室内SiH3摩尔分数分布近似为等离子体分布。由SiH3摩尔分数分布计算出极板间不同区域的等离子体相对介电常数，由此得出不同间距的极板电场分布如图6所示。由于极板间距的增大，极板间流场分布的不均匀性也随着增大，当加载射频功率后，受驻波效应和边缘效应的影响，电场分布的不均匀性也随之增大。图7中当极板间距为10 mm时，电场分布最为均匀，其非均匀性小于5%。 |
回复此楼» 猜你喜欢
论文终于录用啦！满足毕业条件了
已经有20人回复
-
不自信的我
已经有5人回复
-
磺酰氟产物，毕不了业了！
已经有4人回复
-
投稿Elsevier的杂志（返修），总是在选择OA和subscription界面被踢皮球
已经有8人回复
tcollar
木虫 (小有名气)
水上漂
- 翻译EPI: 22
- 应助: 6 (幼儿园)
- 金币: 4851.9
- 红花: 2
- 帖子: 248
- 在线: 124.3小时
- 虫号: 1016612
- 注册: 2010-05-12
- 专业: 应用高分子化学与物理
【答案】应助回帖
★
爱与雨下(金币+1): 2011-10-29 11:54:14
295435736(金币+75): 都一般吧，改了好久 2011-10-29 15:29:36
爱与雨下(金币+1): 2011-10-29 11:54:14
295435736(金币+75): 都一般吧，改了好久 2011-10-29 15:29:36
| Figure 5 shows that the molar fraction distribution of SiH3 was not uniform in between the cathode and anode. More SiH3 can be found around the center of the base plate and less around the edges. To simplify the description of the deposition process, the molar fraction distribution of SiH3 is assumed to be plasma density distribution. The relative dielectric constants of the plasma in between the cathode and anode are calculated based on the molar fraction distribution of SiH3, from which electric field distribution is derived, as depicted in Figure 6. As the distance between the cathode and anode rises, the inhomogeneity of the electric field increases. On the other hand, standing wave effect and edge effect induced by the radio frequency also contribute to the inhomogeneity of the electric field. When the anode is 10 mm away from the cathode, the most homogeneous electric field is achieved, with inhomogeneity<5% (Figure 7). |
3楼2011-10-29 11:49:30