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°®ÓëÓêÏÂ(½ð±Ò+1): 2011-10-29 11:54:08
295435736(½ð±Ò+75, ·­ÒëEPI+1): ¶¼Ò»°ã°É£¬¸ÄÁ˺þà 2011-10-29 15:29:17
As can be seen from Fig.5, the molar proportions of SiH3 between the polar plates had a non-uniform distribution, with densities higher in the center of the substrate and lower in its edges. In this paper, to simplify the complicated physical and chemical procedure of the deposition, the distribution of the SiH3 molar proportions in the reaction chamber was approximated as the plasma distribution. The plasma¡¯s relative dielectric constants in different areas between the polar plates were calculated from the SiH3 molar proportions, and were used to obtain the electric field distributions of the polar plates with different intervals which were shown in Fig.6. Because of the increasing of the polar plates¡¯ interval, the non uniformity of the flow field distribution between the polar plates was also increased, and when the radio frequency power was loaded, affected by the standing wave effect and the edge effect, the non uniformity of the electric field distribution was also increased. In Fig.7, when the interval between the polar plates was 10 mm, the uniformity of the electric field distribution was the biggest, with non uniformity less than 5%.
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°®ÓëÓêÏÂ(½ð±Ò+1): 2011-10-29 11:54:14
295435736(½ð±Ò+75): ¶¼Ò»°ã°É£¬¸ÄÁ˺þà 2011-10-29 15:29:36
Figure 5 shows that the molar fraction distribution of SiH3 was not uniform in between the cathode and anode. More SiH3 can be found around the center of the base plate and less around the edges. To simplify the description of the deposition process, the molar fraction distribution of SiH3 is assumed to be plasma density distribution. The relative dielectric constants of the plasma in between the cathode and anode are calculated based on the molar fraction distribution of SiH3, from which electric field distribution is derived, as depicted in Figure 6. As the distance between the cathode and anode rises, the inhomogeneity of the electric field increases. On the other hand, standing wave effect and edge effect induced by the radio frequency also contribute to the inhomogeneity of the electric field. When the anode is 10 mm away from the cathode, the most homogeneous electric field is achieved, with inhomogeneity<5% (Figure 7).
3Â¥2011-10-29 11:49:30
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