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【答案】应助回帖
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爱与雨下(金币+1): 2011-10-29 11:54:08
295435736(金币+75, 翻译EPI+1): 都一般吧，改了好久 2011-10-29 15:29:17
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As can be seen from Fig.5, the molar proportions of SiH3 between the polar plates had a non-uniform distribution, with densities higher in the center of the substrate and lower in its edges. In this paper, to simplify the complicated physical and chemical procedure of the deposition, the distribution of the SiH3 molar proportions in the reaction chamber was approximated as the plasma distribution. The plasma’s relative dielectric constants in different areas between the polar plates were calculated from the SiH3 molar proportions, and were used to obtain the electric field distributions of the polar plates with different intervals which were shown in Fig.6. Because of the increasing of the polar plates’ interval, the non uniformity of the flow field distribution between the polar plates was also increased, and when the radio frequency power was loaded, affected by the standing wave effect and the edge effect, the non uniformity of the electric field distribution was also increased. In Fig.7, when the interval between the polar plates was 10 mm, the uniformity of the electric field distribution was the biggest, with non uniformity less than 5%. |
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