24小时热门版块排行榜

返回列表

本帖产生 1 个博学EPI ，点击这里进行查看

344840772

新虫 (小有名气)

应助: 0 (幼儿园)
金币: 332.8
帖子: 86
在线: 2.3小时
虫号: 837860
注册: 2009-09-01
专业: 复合材料

[交流] 求一篇文章的EI收录号急急谢谢啦

文章名：X-ray residual stress analysis in different thickness TiN coatings on high-speed-steel substrates
求EI收录号

回复此楼

» 猜你喜欢

面上再次挂了，太难了，躺也躺不了，倦也卷不过，小学校之殇！已经有3人回复
2026年国自然面上资助率已经有11人回复
微信指数没变化，科研之友没阅读已经有18人回复
基础研究怎么拉横向，学校到款任务越来越多，难以完成拉横向，都有哪些途径啊已经有8人回复
HXDI做水性聚氨酯乳液，是不是特别容易出渣已经有3人回复
小木虫看见有人已经知道结果了已经有19人回复
系统今天又提示维护了，估计离放榜不远了已经有15人回复
申请2027年材料/化学类博士已经有5人回复
你们的时间戳变了吗已经有4人回复
今年的WR进展到哪一步了？已经有9人回复

1楼 2010-08-29 17:12:39

已阅回复此楼关注TA 给TA发消息送TA红花 TA的回帖

ganchunlei

至尊木虫 (著名写手)

博学EPI: 166
应助: 0 (幼儿园)
贵宾: 2.296
金币: 12591.6
散金: 514
红花: 8
沙发: 2
帖子: 2353
在线: 1469.4小时
虫号: 257983
注册: 2006-06-10
性别: MM
专业: 有机分析

344840772(金币+4, 博学EPI+1): 2010-08-30 09:25:27

Accession number:  20102813067791

Title:  X-ray residual stress analysis in different thickness TiN coatings on high-speed-steel substrates

Authors:  Gong, Man-Feng1, 2 ; Qiao, Sheng-Ru1 ; Lu, Guo-Feng1 ; Ji, Hao1

Author affiliation:  1  National Key Laboratory of Thermostructure Composite Materials, Northwestern Polytechnical University, Xi'an 710072, China

2  Dept. of Mechano-electronic, Zhanjiang Normal University, Guangdong 524048, China

Corresponding author:  Gong, M.-F. (gongmanfeng@163.com)

Source title:  Cailiao Kexue yu Gongyi/Material Science and Technology

Abbreviated source title:  Cailiao Kexue yu Gongyi

Volume:  18

Issue:  3

Issue date:  June 2010

Publication year:  2010

Pages:  415-419+424

Language:  Chinese

ISSN:  10050299

CODEN:  CKGOEY

Document type:  Journal article (JA)

Publisher:  Harbin Institute of Technology, P.O. Box 136, Harbin, 150001, China

Abstract:  Multi-arc ion plating technique has been used to deposite hard TiN coatings on AISI M2 high-speed-steel (HSS) substrates. The thickness of the substrate was 1.0 mm in all the samples, while five thicknesses of the TiN coatings, respectively, 3.0, 5.0, 7.0, 9.0 and 11.0 μm were used. X-ray diffraction (XRD) has been used for measuring residual stress on TiN coatings. The stresses along five different directions (Ψ=0°, 20.7°, 30°, 37.8° and 45°) on the coating surface have been measured by recording the peak positions of TiN (220) reflection for each 2θ at different tilt angles Ψ. Regardless of the thickness change of TiN coatings employed on substrate, residual compressive stresses are present in the TiN layers. Furthermore, the results reveal the residual stresses in the TiN layers are high. While the coatings thickness changed from3μm to 11μm, the residual stresses in the TiN coatings varied from-3.22 to-2.04GPa, the intrinsic stresses varied from-1.32 to-0.14GPa, the thermal stresses varied from-1.86 to-1.75GPa. The residual stresses in TiN coatings shew a nonlinear change with the increasing coatings thickness. When the coatings thickness was about 8.5μm, the residual stresses in TiN coatings reached to the maximum by fitting polynomial. These changes ascribes to the defects in the TiN coatings, such as the micro-holes, cooling liquid drops and micro-cracks near the interface between the coating and the substrate, increase with the increasing TiN coatings thickness, which leads the residual stresses in TiN coatings to release effectively.

Number of references:  16

Main heading:  Hard coatings

Controlled terms:  Cracks  -  Ion implantation  -  Residual stresses  -  Stress analysis  -  Substrates  -  Titanium nitride  -  X ray diffraction

Uncontrolled terms:  AISI M2  -  Coating surface  -  Cooling liquid  -  Different thickness  -  High speed steel substrate  -  Intrinsic stress  -  Micro holes  -  Multiarc ion plating  -  Nonlinear changes  -  Peak position -  Residual compressive stress  -  Tilt angle  -  TiN coating  -  TiN layers  -  X-ray residual stress  -  XRD

Classification code:  951 Materials Science  -  933.1.1 Crystal Lattice  -  932.1 High Energy Physics  -  931.3 Atomic and Molecular Physics  -  813.1 Coating Techniques  -  813 Coatings and Finishes  -  812.2 Refractories  -  804.2 Inorganic Compounds  -  801 Chemistry  -  714.2 Semiconductor Devices and Integrated Circuits  -  712.1 Semiconducting Materials  -  461 Bioengineering and Biology  -  421 Strength of Building Materials; Mechanical Properties

Database:  Compendex