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When ITO membrane as anode of PTCDA/Si--organic\inorganic photoelectricity detector,underlay  materials are organic which don't apply to hight temperature,ITO membrane need to illuviation under low temperature .This paper use the radio
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When ITO thin film is taken as PTCDA/Si-- organic/inorganic photodetector anode, the substrate material is organic substance that can not withstand high temperature. ITO thin film deposition at low temperature is required. In this paper, RF magnetron sputtering on glass substrate surface is used to deposit ITO transparent conductive film. Then, through four-point probe and ultraviolet visible near-infrared spectroscopy measurement are applied to test conductivity and light transmission rate. The experimental results show that with the increasing pressure in sputtering process, film transmittance and resistivity will gradually deteriorate. While as sputtering power increases, resistivity of thin film will become a good performance but transmittance deteriorated. However, the increase in oxygen partial pressure to some extent, can contribute to improvement of transmittance, at the same time lead resistivity of film increases. But under high-temperature film annealing will reduce resistivity greatly.
Retirement
6Â¥2009-08-11 16:19:38
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