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[1]R. L. Puurunen, A short history of atomic layer deposition: Tuomo Suntola\\\'s atomiclayer epitaxy, Chemical Vapor Deposition,20 (2014) 332-344.
[2]V. Miikkulainen, M. Leskelä, M. Ritala, R. L. Puurunen, Crystallinity ofinorganic films grown by atomic layer deposition: Overview and general trends, Journal of Applied Physics, 113 (2013)021301.
[3]S. M. George, Atomic layer deposition: An overview, Chemical Reviews, 110 (2010) 111-131.
[4]Front Matter, in: Atomic Layer Depositionof Nanostructured Materials, Wiley-VCH Verlag GmbH & Co. KGaA, 2011,pp. I-XXXVI.
[5]S. K. Panda, H. Shin, Step Coverage in ALD, in: Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH VerlagGmbH & Co. KGaA, 2011, pp. 23-40.
[6]C. S. Hwang, Atomic Layer Deposition for Microelectronic Applications, in: Atomic Layer Deposition of NanostructuredMaterials, Wiley-VCH Verlag GmbH & Co. KGaA, 2011, pp. 159-192.
[7]A. J. M. Mackus, A. A. Bol, W. M. M. Kessels, The use of atomic layerdeposition in advanced nanopatterning, Nanoscale,6 (2014) 10941-10960.
[8]F. S. Minaye Hashemi, C. Prasittichai, S. F. Bent, Self-correcting process for highquality patterning by atomic layer deposition, ACS Nano, 9 (2015) 8710-8717.
[9]M. Fang, J. C. Ho, Area-selective atomic layer deposition: Conformal coating, subnanometerthickness control, and smart positioning, ACSNano, 9 (2015) 8651-8654.
[10]N. P. Dasgupta, H. B. R. Lee, S. F. Bent, P. S. Weiss, Recent advances in atomiclayer deposition, Chemistry of Materials,28 (2016) 1943-1947.
[11]B. Ahmed, C. Xia, H. N. Alshareef, Electrode surface engineering by atomiclayer deposition: A promising pathway toward better energy storage, Nano Today, 11 (2016) 250-271.
[12]D. Munoz-Rojas, J. MacManus-Driscoll, Spatial atmospheric atomic layerdeposition: a new laboratory and industrial tool for low-cost photovoltaics, Materials Horizons, 1 (2014) 314-320.
[13]K. Xu, Nonaqueous liquid electrolytes for lithium-based rechargeable batteries,Chemical Reviews, 104 (2004)4303-4418.
[14]K. G. Gallagher, S. Goebel, T. Greszler, M. Mathias, W. Oelerich, D. Eroglu, V.Srinivasan, Quantifying the promise of lithium-air batteries for electricvehicles, Energy & Environmental Science,7 (2014) 1555-1563.
[15]A. C. Kozen, C. F. Lin, A. J. Pearse, M. A. Schroeder, X. Han, L. Hu, S. B.Lee, G. W. Rubloff, M. Noked, Next-generation iithium metal anode engineeringvia atomic layer deposition, ACS Nano,9 (2015) 5884-5892.
[16]X. Meng, D. J. Comstock, T. T. Fister, J. W. Elam, Vapor-phase atomic-controllablegrowth of amorphous Li2S for high-performance lithium¨Csulfur batteries,ACS Nano, 8 (2014) 10963-10972.
[17]S. M. Choi, I. S. Kang, Y. K. Sun, J. H. Song, S. M. Chung, D. W. Kim, Cyclingcharacteristics of lithium metal batteries assembled with a surface modifiedlithium electrode, Journal of PowerSources, 244 (2013) 363-368.
[18]F. Wu, J. Qian, R. Chen, J. Lu, L. Li, H. Wu, J. Chen, T. Zhao, Y. Ye, K.Amine, An effective approach to protect lithium anode and improve cycle performancefor Li¨CS batteries, ACS Applied Materials& Interfaces, 6 (2014) 15542-15549.
[19]H. Tanaka, A. Takeichi, K. Higuchi, T. Motohiro, M. Takata, N. Hirota, J.Nakajima, T. Toyoda, Long-term durability and degradation mechanism ofdye-sensitized solar cells sensitized with indoline dyes, Solar Energy Materials and Solar Cells, 93 (2009) 1143-1148.
[20]H. J. Son, X. Wang, C. Prasittichai, N. C. Jeong, T. Aaltonen, R. G. Gordon, J.T. Hupp, Glass-encapsulated light harvesters: More efficient dye-sensitized solarcells by deposition of self-aligned, conformal, and self-limited silica layers,Journal of the American Chemical Society,134 (2012) 9537-9540.
[21]H. J. Son, C. Prasittichai, J. E. Mondloch, L. Luo, J. Wu, D. W. Kim, O. K.Farha, J. T. Hupp, Dye stabilization and enhanced photoelectrode wettability inwater-based dye-sensitized solar cells through post-assembly atomic layer depositionof TiO2, Journal of theAmerican Chemical Society, 135 (2013) 11529-11532.
[22]J. Lu, B. Liu, J. P. Greeley, Z. Feng, J. A. Libera, Y. Lei, M. J. Bedzyk, P. C.Stair, J. W. Elam, Porous alumina protective coatings on palladium nanoparticlesby self-poisoned atomic layer deposition, Chemistryof Materials, 24 (2012) 2047-2055.
[23]J. Lu, B. Liu, N. P. Guisinger, P. C. Stair, J. P. Greeley, J. W. Elam, First-principlespredictions and in situ experimental validation of alumina atomic layer depositionon metal surfaces, Chemistry of Materials,26 (2014) 6752-6761.
[24]J. Lu, B. Fu, M. C. Kung, G. Xiao, J. W. Elam, H. H. Kung, P. C. Stair, Coking-and sintering-resistant palladium catalysts achieved through atomic layer deposition,Science, 335 (2012) 1205-1208.
[25]B. Fu, J. Lu, P. C. Stair, G. Xiao, M. C. Kung, H. H. Kung, Oxidativedehydrogenation of ethane over alumina-supported Pd catalysts. Effect ofalumina overlayer, Journal of Catalysis,297 (2013) 289-295.
[26]C. Wang, H. Wang, Q. Yao, H. Yan, J. Li, J. Lu, Precisely applying TiO2overcoat on supported Au catalysts using atomic layer deposition for understandingthe reaction mechanism and improved activity in CO oxidation, The Journal of Physical Chemistry C, 120(2016) 478-486.
[27]Q. Yao, C. Wang, H. Wang, H. Yan, J. Lu, Revisiting the Au particle size effecton TiO2-coated Au/TiO2 catalysts in CO oxidation reaction,The Journal of Physical Chemistry C,120 (2016) 9174-9183. |