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《High Resolution X-Ray Diffractometry And Topography》
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High Resolution X-Ray Diffractometry And Topography By D.K. Bowen, Brian K. Tanner Publisher: CRC Number Of Pages: 252 Publication Date: 1998-02-05 ISBN-10 / ASIN: 0850667585 ISBN-13 / EAN: 9780850667585 Binding: Hardcover The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data. Summary: A review Rating: 5 This is a new generation book. Most books available in the field cover the whole history of the X-ray scattering theories and applications. Then, specific applications that are very important in our days for industries and scientific researches are not properly treated. This book does begin where other related books have finished. The issues covered are not found anywhere else together, in a same volume, as they are here. It is fundamental to the new era of materials characterization. http://ifile.it/lxs71ab/0850667585.zip [ Last edited by bio-polymer on 2008-10-9 at 10:13 ] |
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谢谢分享！！！