| 查看: 168 | 回复: 2 | ||
| 本帖产生 1 个 ，点击这里进行查看 | ||
[求助]
Benzotriazole removal on post-Cu CMP cleaning
|
||
| 谁能帮忙查看一下本论文的文章ei检索号，谢谢 |
回复此楼» 本帖附件资源列表
-
欢迎监督和反馈：小木虫仅提供交流平台，不对该内容负责。
本内容由用户自主发布，如果其内容涉及到知识产权问题，其责任在于用户本人，如对版权有异议，请联系邮箱：xiaomuchong@tal.com - 附件 1 : TangJiying.pdf
2015-09-24 17:49:43, 1.55 M
» 猜你喜欢
07化学280分求调剂
已经有3人回复
-
考研化学308分求调剂
已经有8人回复
-
070300化学求调剂
已经有7人回复
-
生物学一志愿985，分数349求调剂
已经有9人回复
-
341求调剂(一志愿湖南大学070300)
已经有4人回复
-
336化工调剂
已经有5人回复
-
279分求调剂 一志愿211
已经有17人回复
-
291求调剂
已经有4人回复
-
328求调剂，英语六级551，有科研经历
已经有12人回复
-
一志愿上海交大生物与医药专硕324分，求调剂
已经有5人回复
baiyuefei
版主 (文学泰斗)
风雪
- 应助: 4642 (副教授)
- 贵宾: 46.969
- 金币: 658104
- 散金: 11616
- 红花: 995
- 沙发: 81
- 帖子: 69424
- 在线: 13328.3小时
- 虫号: 676696
- 注册: 2008-12-18
- 性别: GG
- 专业: 合成药物化学
- 管辖: 有机交流
【答案】应助回帖
感谢参与，应助指数 +1
|
Accession number: 20152500950445 Title: Benzotriazole removal on post-Cu CMP cleaning Authors: Tang, Jiying1, 2; Liu, Yuling1 ; Sun, Ming1; Fan, Shiyan1; Li, Yan1 Author affiliation: 1 Institute of Microelectronics, Hebei University of Technology, Tianjin, China 2 Electrical Engineering Department, Tianjin Metallurgical Vocation-Technology Institute, Tianjin, China Corresponding author: Liu, Yuling Source title: Journal of Semiconductors Abbreviated source title: J. Semicond. Volume: 36 Issue: 6 Issue date: June 1, 2015 Publication year: 2015 Article number: 066001 Language: English ISSN: 16744926 Document type: Journal article (JA) Publisher: Institute of Physics Publishing Abstract: This work investigates systematically the effect of FA/O II chelating agent and FA/O I surfactant in alkaline cleaning solutions on benzotriazole (BTA) removal during post-Cu CMP cleaning in GLSI under the condition of static etching. The best detergent formulation for BTA removal can be determined by optimization of the experiments of single factor and compound cleaning solution, which has been further confirmed experimentally by contact angle (CA) measurements. The resulting solution with the best formulation has been measured for the actual production line, and the results demonstrate that the obtained cleaning solution can effectively and efficiently remove BTA, CuO and abrasive SiO<inf>2</inf> without basically causing interfacial corrosion. This work demonstrates the possibility of developing a simple, low-cost and environmentally-friendly cleaning solution to effectively solve the issues of BTA removal on post-Cu CMP cleaning in a multi-layered copper wafer. © 2015 Chinese Institute of Electronics. Number of references: 11 Main heading: Solution mining Controlled terms: Chelation - Cleaning - Contact angle - Etching - Surface active agents Uncontrolled terms: Alkaline cleaning - Benzotriazole(BTA) - Benzotriazoles - Chelating agent - Cleaning solution - Detergent formulations - Etching rate - Production line Classification code: 502.1 Mine and Quarry Operations - 631.1.1 Liquid Dynamics - 802.2 Chemical Reactions - 802.3 Chemical Operations - 803 Chemical Agents and Basic Industrial Chemicals DOI: 10.1088/1674-4926/36/6/066001 Database: Compendex Compilation and indexing terms, © 2015 Elsevier Inc. Full-text and Local Holdings Links FULL TEXT LINKS Tools in Scopus Cited by: This article has been cited in Scopus since 1996. -------------------------------------------------------------------------------- Author details: View Author Details in Scopus. Tang, J. Liu, Y. Sun, M. Fan, S. Li, Y. View All AuthorsHide AuthorsLearn more about Scopus Add a tag Add a tag scope Public Private My Institution Login for groups Notify Group Checkbox Email Group Add a tag text box -------------------------------------------------------------------------------- My tags -------------------------------------------------------------------------------- Save this on Delicious -------------------------------------------------------------------------------- About Ei About Ei History of Ei About Engineering Village About Engineering Village Accessibility Statement Content Available Who uses EV? Contact and Support Contact and support Blog About Elsevier About Elsevier Terms and Conditions Privacy Policy |
2楼2015-09-24 18:55:05
baiyuefei
版主 (文学泰斗)
风雪
- 应助: 4642 (副教授)
- 贵宾: 46.969
- 金币: 658104
- 散金: 11616
- 红花: 995
- 沙发: 81
- 帖子: 69424
- 在线: 13328.3小时
- 虫号: 676696
- 注册: 2008-12-18
- 性别: GG
- 专业: 合成药物化学
- 管辖: 有机交流
【答案】应助回帖
★ ★ ★ ★ ★
一点红: 金币+5, ★★★★★最佳答案 2015-09-24 19:26:30
sunshan4379: LS-EPI+1, 感谢应助！ 2015-09-24 19:44:15
一点红: 金币+5, ★★★★★最佳答案 2015-09-24 19:26:30
sunshan4379: LS-EPI+1, 感谢应助！ 2015-09-24 19:44:15
| Accession number: 20152500950445 |
3楼2015-09-24 18:55:15
