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Accession number:       
20114214445233
        Title:        Growth of Al doped ZnO thin films on ZnO buffer layer at low temperature
        Authors:        Ma, Li-Gang1; Ma, Shu-Yi1, 2; Chen, Hai-Xia1; Huang, Xin-Li1
        Author affiliation:        1 College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070, China
                2 Key Laboratory of Atomic and Molecular Physics and Functional Materials of Gansu Province, Lanzhou 730070, China
        Corresponding author:        Ma, S.-Y.
        Source title:        Gongneng Cailiao/Journal of Functional Materials
        Abbreviated source title:        Gongneng Cailiao
        Volume:        42
        Issue:        8
        Issue date:        August 2011
        Publication year:        2011
        Pages:        1516-1519
        Language:        Chinese
        ISSN:        10019731
        CODEN:        GOCAEA
        Document type:        Journal article (JA)
        Publisher:        Journal of Functional Materials, P.O. Box 1512, Chongqing, 630700, China
        Abstract:        The Al-doped ZnO (AZO) thin films with different Al contents were deposited on ZnO buffer layer by reactive RF magnetron sputtering technology.The microstructure, surface morphology, luminescence properties of the AZO thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM)and photoluminescence (PL) spectrum, respectively.The results revealed that the preferred orientation of ZnO films became with increasing Al doping concentration.And as Al doping concentration was 0.81at% the ratio of intensity of (002) to other peaks attained maximum, which indicated that appropriate Al-doping can improve the preferred orientation of ZnO films.The average transmittance was above 70%in the visible range.Two blue peaks located at 444nm (2.80eV) and 483nm (2.57eV) and weak green peak located at about 521nm (2.38eV) were observed from the PL spectra of the four samples and the mechanism of luminescence was discussed.
        Number of references:        13
        Main heading:        Aluminum
        Controlled terms:        Buffer layers  -  Magnetron sputtering  -  Metallic films  -  Optical films  -  Photoluminescence  -  Scanning electron microscopy  -  Semiconductor doping  -  Thin films  -  X ray diffraction  -  Zinc oxide
        Uncontrolled terms:        Al content  -  Al doped ZnO thin films  -  Al-doped ZnO  -  Al-doping  -  AZO thin films  -  Low temperatures  -  Luminescence properties  -  Photoluminescence spectrum  -  PL spectra  -  Preferred orientations  -  rf-Magnetron sputtering  -  XRD  -  ZnO  -  ZnO buffer layer  -  ZnO films
        Classification code:        931.3 Atomic and Molecular Physics -  804.2 Inorganic Compounds -  741.3 Optical Devices and Systems -  741.1 Light/Optics -  933.1 Crystalline Solids -  714.2 Semiconductor Devices and Integrated Circuits -  539.3 Metal Plating -  539 Metals Corrosion and Protection; Metal Plating -  531 Metallurgy and Metallography -  541.1 Aluminum
        Database:        Compendex
                Compilation and indexing terms, © 2015 Elsevier Inc.
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