| 查看: 483 | 回复: 1 | ||
| 本帖产生 1 个 翻译EPI ，点击这里进行查看 | ||
[求助]
翻译
|
||
|
SnO2 thin films were deposited on glass substrates by using Successive Ionic Layer Adsorption and Reaction (SILAR) method at room temperature. The film thickness effect on characteristic parameters such as structural, morphological, optical and electrical properties of the films was studied. Also, the films were annealed in oxygen atmosphere (400 C, 30 min) and characteristic parameters of the films were investigated. The X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM) studies showed that all the films exhibited polycrystalline nature with tetragonal structure and were covered well on glass substrates. After the investigation of the crystalline and surface properties of the films, it was found that they were improving with increasing film thickness. Optical band gap decreased from 3.90 eV to 3.54 eV and electrical conductivity changed between 0.015e0.815 (U-cm)L1 as the film thickness increased from 215 to 490 nm. The refractive index (n), optical static and high frequency dielectric constants ( 3o, 3N) values were calculated by using the optical band gap values as a function of the film thickness. |
回复此楼» 猜你喜欢
A期刊撤稿
已经有3人回复
-
职称评审没过，求安慰
已经有34人回复
-
垃圾破二本职称评审标准
已经有17人回复
-
回收溶剂求助
已经有6人回复
-
投稿Elsevier的Neoplasia杂志，到最后选publishing options时页面空白，不能完成投稿
已经有22人回复
-
申请26博士
已经有5人回复
-
EST投稿状态问题
已经有7人回复
-
毕业后当辅导员了，天天各种学生超烦
已经有4人回复
-
求助文献
已经有3人回复
-
投稿返修后收到这样的回复，还有希望吗
已经有8人回复
18236135970
银虫 (小有名气)
- 翻译EPI: 6
- 应助: 2 (幼儿园)
- 金币: 686.2
- 散金: 1150
- 红花: 2
- 帖子: 60
- 在线: 55.9小时
- 虫号: 3431437
- 注册: 2014-09-21
- 性别: GG
- 专业: 化学工程及工业化学
【答案】应助回帖
★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ...
孑阿杰: 金币+150, 翻译EPI+1, ★★★★★最佳答案, 感谢 2015-03-11 22:46:52
孑阿杰: 金币+150, 翻译EPI+1, ★★★★★最佳答案, 感谢 2015-03-11 22:46:52
|
连续离子层吸附反应法(SILAR)制备SnO2薄膜及其特性研究 摘要： 室温下，利用SILAR法将SnO2薄膜沉积在玻璃基板上，研究膜厚对特性参数如：结构、形态、光学和电学性质的影响。膜在氧气氛围（400°C,30min）中退火，同时研究膜的特性参数。X射线衍射和扫描电子显微镜（SEM）研究表明所有的膜呈现天然多晶四方体结构，并且很好的覆盖在玻璃基板上。研究了膜的晶体和表面性质后发现它们随膜厚度增加而提高。随着膜厚度由215-490nm增加，光学带隙从3.90ev提升到3.54ev,电导率在0.015-0.815（Ω.cm）-1间变化。通过使用光学带隙值计算折光率和高频介电常数（ε0，ε∞）值作为膜厚度的一个函数。 [ 发自手机版 https://muchong.com/3g ] |
2楼2015-03-11 22:45:27