| 查看: 1130 | 回复: 21 | ||
| 【奖励】 本帖被评价20次，作者gyliu增加金币 19.5 个 | ||
| 当前主题已经存档。 | ||
[资源]
《Handbook of Physical Vapor Deposition (PVD) Processing》
|
||
|
Donald M. Mattox “Handbook of Physical Vapor Deposition (PVD) Processing" Noyes Publications; 1 edition (March 1, 1998) | ISBN: 0815514220 | 949 pages | PDF | 6,3 Mb This book covers all aspects of Physical Vapor Deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to postdeposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called “war stories”, to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. http://depositfiles.com/en/files/4545551 http://w16.easy-share.com/1700052255.html http://rapidshare.com/files/1051 ... apor_Deposition.rar  [ Last edited by 江南豪情 on 2008-4-13 at 11:55 ] |
回复此楼» 猜你喜欢
293求调剂
已经有3人回复
-
335求调剂
已经有5人回复
-
305求调剂
已经有7人回复
-
313求调剂
已经有3人回复
-
310求调剂
已经有12人回复
-
290求调剂
已经有7人回复
-
电气专硕320求调剂
已经有5人回复
-
一志愿西北工业大学289 085602
已经有33人回复
-
一志愿哈工大 085600 277 12材科基求调剂
已经有24人回复
-
268分085602化学工程调剂
已经有28人回复
3楼2008-04-13 09:37:40
5楼2008-04-13 09:54:00
6楼2008-04-13 11:06:20
7楼2008-04-13 16:02:51
8楼2008-04-13 19:05:17
9楼2008-04-13 19:22:42
11楼2008-04-14 09:41:37
13楼2008-04-14 12:07:09
14楼2008-04-14 16:30:34
|
本帖内容被屏蔽 |
15楼2008-04-14 18:01:22
简单回复
ycwbycwb2楼
2008-04-13 07:39
回复
2008-04-13 09:43
回复
2008-04-14 09:29
回复
kcfreedom00112楼
2008-04-14 10:05
回复
20