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may171木虫 (正式写手)
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[求助]
请问大家 Ni 反蛋白石结构光子晶体如何制备
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都有哪些制备方法呢，从文献上看到有电化学沉积的方法： 如下：The substrate was prepared by evaporating ca. 30 nm of gold on a 700 lm thick silicon wafer using 1 nm of chromium as an adhesion layer. It was then soaked in a saturated 3-mercapto-1-propanesulfonic acid, sodium salt (HS-(CH2)3-SO3Na) ethanol solution for 30 min forming a monolayer of hydrophilic molecules on the gold surface. 2.2 lm diameter sulfate-terminated PS spheres (Molecular Probes) were formed into an opal film on this substrate via evaporative deposition at 50 °C with a colloid volume concentration of 0.4% in water [22]. Ni was electrodeposited using the electrodeposition solution Techni Nickel S (Technic) under constant current mode (1 mAcm–2) in a two-electrode setup with a platinum flag as the anode. Electropolishing was performed using the solution, EPS1250 (Electro Polish Systems) under constant voltage mode (4 V) in a twoelectrode setup with a stainless-steel plate as cathode. Polishing was performed with 1 s pulses with 10 s intervals. The interval was selected to allow ions to diffuse in and out of the inverse opal between etching pulses. 从未用过电化学工作站，上述方法用的电解液 Techni Nickel S (Technic) 是什么东东呢，有没有比电化学沉积更为简便的方法呢，求赐教！谢谢 |
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