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ÈçÏ£ºThe substrate was prepared by evaporating ca. 30 nm of gold on a
700 lm thick silicon wafer using 1 nm of chromium as an adhesion
layer. It was then soaked in a saturated 3-mercapto-1-propanesulfonic
acid, sodium salt (HS-(CH2)3-SO3Na) ethanol solution for 30 min
forming a monolayer of hydrophilic molecules on the gold surface.
2.2 lm diameter sulfate-terminated PS spheres (Molecular Probes)
were formed into an opal film on this substrate via evaporative deposition
at 50 ¡ãC with a colloid volume concentration of 0.4% in
water [22]. Ni was electrodeposited using the electrodeposition solution
Techni Nickel S (Technic) under constant current mode
(1 mAcm¨C2) in a two-electrode setup with a platinum flag as the anode.
Electropolishing was performed using the solution, EPS1250
(Electro Polish Systems) under constant voltage mode (4 V) in a twoelectrode
setup with a stainless-steel plate as cathode. Polishing was
performed with 1 s pulses with 10 s intervals. The interval was selected
to allow ions to diffuse in and out of the inverse opal between
etching pulses.

´ÓδÓùýµç»¯Ñ§¹¤×÷Õ¾£¬ÉÏÊö·½·¨Óõĵç½âÒº Techni Nickel S (Technic) ÊÇʲô¶«¶«ÄØ£¬ÓÐûÓбȵ绯ѧ³Á»ý¸üΪ¼ò±ãµÄ·½·¨ÄØ£¬Çó´Í½Ì£¡Ð»Ð»
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