| 查看: 255 | 回复: 1 | ||
[求助]
文献求助： Interfacial Layer Development for 20nm High-k Last Integration Scheme
|
|
文献求助：Full Text (PDF) Interfacial Layer Development for 20nm High-k Last Integration Scheme ECS Trans. 2014 60(1): 727-731; 感激不尽 Full Text (PDF) Han Jie Gao, Jie Zhao, Jia Hua Min, Yi Zhi Zeng, Kurban Awut, Woei Ji Song, and Shao Feng Yu Interfacial Layer Development for 20nm High-k Last Integration Scheme ECS Trans. 2014 60(1): 727-731; |
回复此楼
2楼2014-04-08 15:06:59
