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[交流] 半导体材料的带隙可以通过哪些测试手段获得？谢啦！

金属氧化物半导体材料的带隙可以通过哪些测试手段获得？谢啦

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1楼 2006-12-14 19:45:14

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引用回帖:

Originally posted by xutongkk at 2006-12-15 01:35 PM:
XPS,x射线光电子能谱

Yes, XPS can be used for such purpose. But as far as I know, it can only show the valence band position. For those who need to determine the band bending, schottky barrier height, or heterojunction band discontinuity..., this might be also a good technique. I will try to find some literature on this and keep you guys updated.

UV-Vis is the most popular technique for the determination of band gap energy of semiconductor materials. But again, whether we should take the absorption edge or the inflection point, whether we need Kubelka-Munk or not??? These are all question mark to me. So I would be more than happy to know what you guys think.