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Graphene nanoribbons (GNRs) are materials with properties distinct from those of other carbon allotropes1¨C5. The all-semiconducting nature of sub-10-nm GNRs could bypass the problem of the extreme chirality dependence of the metal or semiconductor nature of carbon nanotubes (CNTs) in future electronics1,2.Currently, making GNRs using lithographic3,4,6, chemical7¨C9 or sonochemical1 methods is challenging. It is difficult to obtain GNRs with smooth edges and controllable widths at high yields.Here we show an approach to making GNRs by unzipping multiwalled carbon nanotubes by plasma etching of nanotubes partly embedded in a polymer film. The GNRs have smooth edges and a narrow width distribution (10¨C20 nm). Raman spectroscopy and electrical transport measurements reveal the high quality of the GNRs. Unzipping CNTs with well-defined structures in an array will allow the production of GNRs with controlled widths, edge structures, placement and alignment in a scalable fashion for device integration.
The high carrier mobility of graphene10¨C14 offers the possibility of building high-performance graphene-based electronics. Recently, both theoretical15¨C18 and experimental1¨C4 works have shown that quantum confinement and edge effects introduce a band gap in narrowgraphene ribbons independent of chirality, and the resulting GNR semiconductors can be used to make field-effect transistors. Several approaches have been developed to obtain GNRs. Lithographic patterning has been used to produce wide ribbons (.20nm) from graphene sheets3,4, but the width and smoothness of the GNRs were limited by the resolution of the lithography and etching techniques.Bulkamounts of wide (20¨C300nm) and few-layered (2¨C40)GNRswere synthesized by a chemical vapour deposition method9. A chemical sonication route developed by our group produced sub-10-nm GNR semiconductors from intercalated and exfoliated graphite1. However,the yield of GNRs was low and their width distribution was broad;widths ranged from less than 10nm to ,100 nm.

[ Last edited by ÍõÁé½Ü on 2011-6-1 at 12:12 ]
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Graphene nano ribbons (GNRs) are materials with properties distinct from those of other carbon allotropes1¨C5. ʯīϩÄÉÃ×´ø(GNR)ÊÇÒ»ÖÖ¾ßÓÐÓëÆäËûÌ¼Í¬ËØÒìÐÎÌå½ØÈ»²»Í¬ÌØÐԵIJÄÁÏ.The all-semiconducting nature of sub-10-nm GNRs could bypass the problem of the extreme chirality dependence of the metal or semiconductor nature of carbon nanotubes (CNTs) in future electronics1,2. 10nmÒÔÏÂGNRµÄÍêÈ«°ëµ¼ÌåÌØÐÔ¿ÉÔÚδÀ´µÄµç×Ó¹¤ÒµÖÐʹÓÃÒÔÈÆ¿ª½ðÊôµÄ¼«¶ËÊÖÐÔÒÀÀµ»ò̼ÄÉÃ׹ܰ뵼ÌåÌØÐÔÎÊÌâ.Currently, making GNRs using lithographic3,4,6, chemical7¨C9 or sonochemical1 methods is challenging. Ŀǰ,ͨ¹ýƽ°åÓ¡Ë¢¡¢»¯Ñ§»òÉù»¯Ñ§·½·¨ÖƱ¸GNR¶¼ÃæÁÙÌôÕ½¡£It is difficult to obtain GNRs with smooth edges and controllable widths at high yields. ºÜÄÑÒԸ߲úÂÊ»ñµÃ±ßԵƽ»¬¡¢¿í¶È¿É¿ØµÄGNR¡£Here we show an approach to making GNRs by unzipping multiwalled carbon nanotubes by plasma etching of nanotubes partly embedded in a polymer film. ÕâÀïÎÒÃÇչʾһÖÖÖÆ±¸GNRµÄ·½·¨£ºÍ¨¹ýµÈÀë×ÓÊ´¿Ì²¿·Ö¹Ì¶¨ÔÚ¾ÛºÏÎïĤÉϵÄÄÉÃ׹ܰþ¿ª¶à²ã±ÚµÄ̼ÄÉÃ׹ܡ£The GNRs have smooth edges and a narrow width distribution (10¨C20 nm). ´Ë·¨ÖƱ¸µÄGNR¾ßÓÐÆ½»¬µÄ±ßÔµºÍÕ­µÄ¿í¶È·Ö²¼£¨10-20nm£©¡£Raman spectroscopy and electrical transport measurements reveal the high quality of the GNRs. À­Âü¹âÆ×ºÍµçÔËÔØ²â¶¨ÏÔʾÁËÕâÀàGNRÓÅÁ¼µÄÖÊÁ¿¡£Unzipping CNTs with well-defined structures in an array will allow the production of GNRs with controlled widths, edge structures, placement and alignment in a scalable fashion for device integration.°þ¿ªÕóÁÐÅŲ¼½á¹¹Ã÷È·µÄ̼ÄÉÃ×¹ÜʹµÃÖÆ±¸É豸¼¯³É¿ÉÓõĿí¶È¡¢±ßÔµ½á¹¹¿É¿Ø¡¢ÒԿɵ÷½Ú·½Ê½²¼¾ÖºÍ¶¨Î»µÄGNR³ÉΪ¿ÉÄÜ¡£
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ÍõÁé½Ü(½ð±Ò+200, ·­ÒëEPI+1): лл°¡£¬·Ç³£¸Ðл°¡£¡£¡ 2011-06-01 20:53:48
The high carrier mobility of graphene10¨C14 offers the possibility of building high-performance graphene-based electronics. ʯīϩµÄ¸ßÔØ×ÓÒÆ¶¯ÂÊÌṩÁ˹¹½¨¸ßÐÔÄÜʯīϩµç×Ó²úÆ·µÄ¿ÉÄÜÐÔ¡£Recently, both theoretical15¨C18 and experimental1¨C4 works have shown that quantum confinement and edge effects introduce a band gap in narrow graphene ribbons independent of chirality, and the resulting GNR semiconductors can be used to make field-effect transistors.½üÀ´£¬ÀíÂÛºÍʵÑéÑо¿¹¤×÷¶¼ÏÔʾ£¬Á¿×ÓÏÞÖÆºÍ±ßԵЧӦÔÚխʯīϩ´øÒýÈë²»ÊÜÊÖÐÔÖ§ÅäµÄ´øÏ¶¡£ Several approaches have been developed to obtain GNRs.ÒÑ¿ª·¢Á˼¸ÖÖ»ñÈ¡GNRµÄ;¾¶¡£ Lithographic patterning has been used to produce wide ribbons (.20nm) from graphene sheets3,4, but the width and smoothness of the GNRs were limited by the resolution of the lithography and etching techniques. ƽ°æÓ¡Ë¢Ê´¿Ì¼¼Êõ±»ÓÃÀ´ÓÉÊ¯Ä«Ï©Æ¬ÖÆ±¸¿í´ø£¬µ«ÆäÖÆ±¸µÄGNRµÄ¿í¶ÈºÍƽ»¬¶ÈÊÜÏÞÓÚÆ½°æÓ¡Ë¢ºÍÊ´¿Ì¼¼ÊõµÄ·Ö±æÂÊ¡£Bulk amounts of wide (20¨C300nm) and few-layered (2¨C40)GNRs were synthesized by a chemical vapour deposition method9.Óû¯Ñ§ÕôÆø³Áµí·½·¨ºÏ³ÉÁË´óÁ¿ ¿í¶ÈΪ20-300nmµÄÉÙÊý²ã£¨2-40£©GNR¡£A chemical sonication route developed by our group produced sub-10-nm GNR semiconductors from intercalated and exfoliated graphite1.Ò»ÖÖÓÉÎÒÃÇ¿ÎÌâ×鿪·¢µÄ»¯Ñ§³¬Éù·Ïß¿ÉÓɲåÈëºÍƬ״°þÂäµÄÊ¯Ä«Ï©ÖÆ±¸10nmÒÔϵÄGNR°ëµ¼Ìå¡£ However,the yield of GNRs was low and their width distribution was broad;widths ranged from less than 10nm to ,100 nm.È»¶ø£¬´Ë·¨ÖƱ¸GNRµÄ²úÂʵÍÇÒ¿í¶È·Ö²¼½Ï¿í£¬¿í¶È¿ÉÓɲ»×ã10nmµ½100nm¡£
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