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至尊木虫 (职业作家)

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虫号: 1184404
注册: 2011-01-06
专业: 药物学其他科学问题

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yt.yutian.(金币+5, 翻译EPI+1): 谢谢 2011-05-30 16:00:36

Another consequence of poor mask-wafer contact is sidewall roughness.不良的掩膜-晶片接触的另一个结果时候是侧壁粗糙。Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. 聚酯掩膜和玻璃掩膜PDMS装置的场致发射扫描电镜图像分别显示在图2 c和d。The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. 在由聚酯掩膜制备的PDMS装置，平均壁粗糙度约为1.5 ím ，比玻璃掩膜者小0.5 ím 。The mean wall roughness spacing is measured from the SEM images as 1.5 ím. 从扫描电镜图像上测得的平均粗糙度间隔为1.5 ím 。Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices.后面我们显示侧壁粗糙度对这些设备的色散和分辨率具有重要影响。

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