| 查看: 613 | 回复: 2 | |||
| 本帖产生 1 个 翻译EPI ,点击这里进行查看 | |||
yt.yutian.金虫 (小有名气)
|
[求助]
翻译2句话
|
||
|
Another consequence of poor mask-wafer contact is sidewall roughness. Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. The mean wall roughness spacing is measured from the SEM images as 1.5 ím. Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices. |
» 猜你喜欢
一志愿华南师范大学0702物理学305调剂
已经有5人回复
求调剂
已经有30人回复
266求调剂
已经有10人回复
297求调剂
已经有16人回复
326分,一志愿沪9,求生物学调剂
已经有4人回复
288求调剂,一志愿华南理工大学071005
已经有3人回复
304求调剂
已经有13人回复
调剂
已经有18人回复
293调剂
已经有4人回复
338求调剂
已经有7人回复
8814402
至尊木虫 (职业作家)
- 翻译EPI: 509
- 应助: 18 (小学生)
- 贵宾: 0.381
- 金币: 12916.1
- 散金: 47
- 红花: 16
- 帖子: 4183
- 在线: 357.8小时
- 虫号: 1184404
- 注册: 2011-01-06
- 专业: 药物学其他科学问题
【答案】应助回帖
yt.yutian.(金币+5, 翻译EPI+1): 谢谢 2011-05-30 16:00:36
| Another consequence of poor mask-wafer contact is sidewall roughness.不良的掩膜-晶片接触的另一个结果时候是侧壁粗糙。Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. 聚酯掩膜和玻璃掩膜PDMS装置的场致发射扫描电镜图像分别显示在图2 c和d。The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. 在由聚酯掩膜制备的PDMS装置,平均壁粗糙度约为1.5 ím ,比玻璃掩膜者小0.5 ím 。The mean wall roughness spacing is measured from the SEM images as 1.5 ím. 从扫描电镜图像上测得的平均粗糙度间隔 为1.5 ím 。Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices.后面我们显示侧壁粗糙度对这些设备的色散和分辨率具有重要影响。 |
2楼2011-05-30 09:20:45
8814402
至尊木虫 (职业作家)
- 翻译EPI: 509
- 应助: 18 (小学生)
- 贵宾: 0.381
- 金币: 12916.1
- 散金: 47
- 红花: 16
- 帖子: 4183
- 在线: 357.8小时
- 虫号: 1184404
- 注册: 2011-01-06
- 专业: 药物学其他科学问题
【答案】应助回帖
| Another consequence of poor mask-wafer contact is sidewall roughness.不良的掩膜-晶片接触的另一个结果时候是侧壁粗糙。Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. 聚酯掩膜和玻璃掩膜PDMS装置的场致发射扫描电镜图像分别显示在图2 c和d。The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. 在由聚酯掩膜制备的PDMS装置,平均壁粗糙度约为1.5 ím ,比玻璃掩膜者小0.5 ím 。The mean wall roughness spacing is measured from the SEM images as 1.5 ím. 从扫描电镜图像上测得的平均粗糙度间隔 为1.5 ím 。Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices.后面我们显示侧壁粗糙度对这些设备的色散和分辨率具有重要影响。 |
3楼2011-05-30 09:21:42














回复此楼