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北京石油化工学院2026年研究生招生接收调剂公告
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yt.yutian.

金虫 (小有名气)

[求助] 翻译2句话

Another consequence of poor mask-wafer contact is sidewall
roughness. Field emission scanning electron microscopy
(FESEM) images of PDMS devices for a Mylar mask and a glass
mask are shown in parts c and d of Figure 2, respectively. The
PDMS devices made from Mylar masks result in a mean wall
roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for
glass masks. The mean wall roughness spacing  is measured
from the SEM images as 1.5 ím. Later we show that the sidewall
roughness has a dramatic effect on the dispersion and resolution
of these devices.

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8814402

至尊木虫 (职业作家)

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yt.yutian.(金币+5, 翻译EPI+1): 谢谢 2011-05-30 16:00:36
Another consequence of poor mask-wafer contact is sidewall roughness.不良的掩膜-晶片接触的另一个结果时候是侧壁粗糙。Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. 聚酯掩膜和玻璃掩膜PDMS装置的场致发射扫描电镜图像分别显示在图2 c和d。The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. 在由聚酯掩膜制备的PDMS装置,平均壁粗糙度约为1.5 ím ,比玻璃掩膜者小0.5 ím 。The mean wall roughness spacing   is measured from the SEM images as 1.5 ím. 从扫描电镜图像上测得的平均粗糙度间隔 为1.5 ím 。Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices.后面我们显示侧壁粗糙度对这些设备的色散和分辨率具有重要影响。
2楼2011-05-30 09:20:45
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8814402

至尊木虫 (职业作家)

【答案】应助回帖

Another consequence of poor mask-wafer contact is sidewall roughness.不良的掩膜-晶片接触的另一个结果时候是侧壁粗糙。Field emission scanning electron microscopy (FESEM) images of PDMS devices for a Mylar mask and a glass mask are shown in parts c and d of Figure 2, respectively. 聚酯掩膜和玻璃掩膜PDMS装置的场致发射扫描电镜图像分别显示在图2 c和d。The PDMS devices made from Mylar masks result in a mean wall roughness (Lr) of about 1.5 ím whereas it is less than 0.5 ím for glass masks. 在由聚酯掩膜制备的PDMS装置,平均壁粗糙度约为1.5 ím ,比玻璃掩膜者小0.5 ím 。The mean wall roughness spacing   is measured from the SEM images as 1.5 ím. 从扫描电镜图像上测得的平均粗糙度间隔 为1.5 ím 。Later we show that the sidewall roughness has a dramatic effect on the dispersion and resolution of these devices.后面我们显示侧壁粗糙度对这些设备的色散和分辨率具有重要影响。
3楼2011-05-30 09:21:42
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