| ²é¿´: 483 | »Ø¸´: 3 | |||
| ±¾Ìû²úÉú 1 ¸ö ·ÒëEPI £¬µã»÷ÕâÀï½øÐв鿴 | |||
gloria_grxгæ (³õÈëÎÄ̳)
|
[½»Á÷]
ÇëÎÊÒ»ÏÂfluorocarbon-containing plasmaµÄÒâ˼£¿
|
||
| ÇëÎÊһϴó¼Ò£¬fluorocarbon-containing plasmaµÄÒâ˼µ½µ×ÊǺ¬·ú̼»¯ºÏÎïµÈÀë×ÓÌ壬»¹ÊÇ·ú̼»¯ºÏÎïÍ¿²ãµÈÀë×ÓµÄÒâË¼ÄØ£¿Ð»Ð»~ |
» ²ÂÄãϲ»¶
292Çóµ÷¼Á
ÒѾÓÐ8È˻ظ´
Çóµ÷¼Á
ÒѾÓÐ4È˻ظ´
Ò»Ö¾Ô¸ Î÷±±´óѧ ×Ü·Ö282 Ó¢ÓïÒ»62 Çóµ÷¼Á
ÒѾÓÐ3È˻ظ´
µ÷¼Á310
ÒѾÓÐ4È˻ظ´
±±¿Æ281ѧ˶²ÄÁÏÇóµ÷¼Á
ÒѾÓÐ16È˻ظ´
Ò»Ö¾Ô¸ÉϺ£½»´óÉúÎïÓëҽҩר˶324·Ö£¬Çóµ÷¼Á
ÒѾÓÐ6È˻ظ´
Ò»Ö¾Ô¸¹þ¹¤´ó£¬085400£¬320£¬Çóµ÷¼Á
ÒѾÓÐ4È˻ظ´
316Çóµ÷¼Á
ÒѾÓÐ9È˻ظ´
085600 ²ÄÁÏÓ뻯¹¤ 329·ÖÇóµ÷¼Á
ÒѾÓÐ8È˻ظ´
0856Çóµ÷¼Á
ÒѾÓÐ6È˻ظ´
cfm877
Ìú¸Ëľ³æ (ÖªÃû×÷¼Ò)
- ·ÒëEPI: 31
- Ó¦Öú: 5 (Ó×¶ùÔ°)
- ½ð±Ò: 5903.8
- É¢½ð: 3751
- ºì»¨: 26
- ɳ·¢: 357
- Ìû×Ó: 6677
- ÔÚÏß: 976.9Сʱ
- ³æºÅ: 466781
- ×¢²á: 2007-11-24
- ÐÔ±ð: GG
- רҵ: »·¾³Î¢ÉúÎïѧ

2Â¥2010-11-07 11:55:25
¹Å¿É¤×
ÈÙÓþ°æÖ÷ (ÎÄ̳¾«Ó¢)
- ·ÒëEPI: 323
- Ó¦Öú: 91 (³õÖÐÉú)
- ¹ó±ö: 16.835
- ½ð±Ò: 19237.1
- É¢½ð: 40372
- ºì»¨: 275
- ɳ·¢: 183
- Ìû×Ó: 25406
- ÔÚÏß: 1082.3Сʱ
- ³æºÅ: 1034379
- ×¢²á: 2010-06-02
- ÐÔ±ð: GG
- רҵ: Ò©ÎïÉè¼ÆÓëÒ©ÎïÐÅÏ¢
- ¹ÜϽ: µ¼Ê¦ÕÐÉú

3Â¥2010-11-07 12:08:45
wust67
½ð³æ (ÖøÃûдÊÖ)
- ·ÒëEPI: 54
- Ó¦Öú: 1 (Ó×¶ùÔ°)
- ¹ó±ö: 0.005
- ½ð±Ò: 921.3
- É¢½ð: 175
- ºì»¨: 7
- Ìû×Ó: 1627
- ÔÚÏß: 339.5Сʱ
- ³æºÅ: 1009964
- ×¢²á: 2010-05-02
- רҵ: ¸ß·Ö×Ӻϳɻ¯Ñ§
gloria_grx(½ð±Ò+1): 2010-11-13 09:17:35
|
³ÂÀÖÀÖ ÖìÁÁ Ðìê¿î£ Àϼ ²Ì»Ô °ü´óÓ Role of CF_2 in the etching of SiO_2,Si_3N_4 and Si in fluorocarbon plasma ¡¶°ëµ¼Ìåѧ±¨¡· 2009Äê03ÆÚ ¹Ø¼ü´Ê£ºCF;SiO etching;fluorocarbon film ÂÔÀÀÁ˸ÃÎÄÕªÒª£¬fluorocarbon-containing plasmaÒâΪ¡°º¬·ú̼»¯ºÏÎïµÄĤ¡±¡£ https://www.cnki.com.cn/Article/CJFDTotal-BDTX200903008.htm |
4Â¥2010-11-07 14:35:46













»Ø¸´´ËÂ¥
20