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【资源】最新AM的REVIEW 【关于Si衬底上生长oxides】
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This review outlines developments in the growth of crystalline oxides on the ubiquitous silicon semiconductor platform. The overall goal of this endeavor is the integration of multifunctional complex oxides with advanced semiconductor technology. Oxide epitaxy in materials systems achieved through conventional deposition techniques is described fi rst, followed by a description of the science and technology of using atomic layer-by-layer deposition with molecular beam epitaxy (MBE) to systematically construct the oxide–silicon interface. An interdisciplinary approach involving MBE, advanced real-space structural characterization, and fi rst-principles theory has led to a detailed understanding of the process by which the interface between crystalline oxides and silicon forms, the resulting structure of the interface, and the link between structure and functionality. Potential applications in electronics and photonics are also discussed. 易盘下载: http://www.163pan.com/files/80h000s0j.html 文件名称: 综述 Crystalline Oxides on Silicon.pdf 文件介绍: 综述 Crystalline Oxides on Silicon.pdf ==============================  [ Last edited by Frank18711 on 2010-5-6 at 10:15 ] |
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