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Frank18711

木虫 (正式写手)

应助: 1 (幼儿园)
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在线: 1227.7小时
虫号: 587809
注册: 2008-08-22
性别: GG
专业: 凝聚态物性 II ：电子结构

[交流] 【资源】最新AM的REVIEW 【关于Si衬底上生长oxides】

This review outlines developments in the growth of crystalline oxides on the
ubiquitous silicon semiconductor platform. The overall goal of this endeavor
is the integration of multifunctional complex oxides with advanced semiconductor
technology. Oxide epitaxy in materials systems achieved through conventional
deposition techniques is described fi rst, followed by a description
of the science and technology of using atomic layer-by-layer deposition with
molecular beam epitaxy (MBE) to systematically construct the oxide–silicon
interface. An interdisciplinary approach involving MBE, advanced real-space
structural characterization, and fi rst-principles theory has led to a detailed
understanding of the process by which the interface between crystalline
oxides and silicon forms, the resulting structure of the interface, and the link
between structure and functionality. Potential applications in electronics and
photonics are also discussed.

易盘下载:
http://www.163pan.com/files/80h000s0j.html
文件名称:
综述 Crystalline Oxides on Silicon.pdf
文件介绍:
综述 Crystalline Oxides on Silicon.pdf
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