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【交流】美国丹佛会议的最新进展call for paper
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http://www.dxcicdd.com/10/callforpapers.htm The 59th Annual DXC Call for Papers Abstracts for oral presentation are no longer being accepted. Abstracts for poster presentation may continue to be submitted up until July 1. Workshops Monday & Tuesday, 2 & 3 August XRD & XRF The exact date and time of each workshop will not be determined until April 2010. EXAFS Organizers: C. Segre, Illinois Institute of Technology, Chicago, IL, segre@iit.edu M. Newville, University of Chicago/Argonne National Laboratory, Argonne, IL, newville@cars.uchicago.edu B. Ravel, National Institute of Standards & Technology, Gaithersburg, MD, bruce.ravel@nist.gov Description to be announced. Cultural Heritage — Full day Organizers & Instructors: M. Walton, Getty Conservation Institute, Los Angeles, CA, mwalton@getty.edu K. Eremin, Harvard Art Museum, Cambridge, MA, katherine_eremin@harvard.edu A. Bezur, The Museum of Fine Arts, Houston Conservation, Houston, TX A. Drews, Ford Research & Advanced Engineering, Ford Motor Company, Dearborn, MI J. Dik, Delft University of Technology, Delft, The Netherlands K. Trentelman, Getty Conservation Institute, Los Angeles, CA This workshop will be focused on the use of XRF and XRD to analyze works of art. The instructors will discuss both the general use of these techniques and their limitations, as well as the specialized issues surrounding the use of this instrumentation on works of art. An emphasis will be placed this year on the characterization of ceramics, glazes, and glasses which often contain difficult to analyze light elements. Discussions will therefore be centered on the optimization of portable XRF instruments for the analysis of these materials. XRD Trace Phase Identification using Chemical Information Organizers: T. Fawcett, International Centre for Diffraction Data, Newtown Square, PA, fawcett@icdd.com J. Kaduk, Poly Crystallography Inc., Naperville, IL, kaduk@polycrystallography.com We have all been challenged at some point in trying to identify important materials in complex mixtures based on a minimum (1-2 lines) amount of diffraction data. Often, even the best batch processed phase identification software has difficulty with minor and trace phase identification (1-10 weight %), simply due to a lack of statistical significance in the data. However, most of the time, the analyst knows some information about the specimen that is not reflected in the XRD data. The analyst may know the sample history, type of sample, and some knowledge of the chemistry, physical properties or observational behavior (i.e., hardness, bubbles with acid). Tools such as relational databases, LeBail refinement, pattern simulations, and Rietveld refinements can be used to search and find information about a sample that provides significance when coupled with just a few observations in the diffraction data. This workshop will use actual examples, demonstrating both the tools and processes for successfully identifying the needles in a haystack. We will focus on the methods and tools used after the bulk phases have been identified which will enable the analyst to identify the minor and trace components. The tools and processes can help a good analyst become a great analyst! Texture Analysis — Full day Organizer & Instructors: H. Schaeben, Freiberg University of Mining & Technology, Freiberg, Saxony, Germany, schaeben@geo.tu-freiberg.de C. Lavoie, IBM Research, T.J. Watson Research Center, Yorktown Heights, NY R. Hielscher, Helmholtz Zentrum München; GSF - Forschungszentrum für Umwelt und Gesundheit, Neuherberg, Germany F. Bachmann, Technische Universität Bergakademie Freiberg, Freiberg, Germany Texture analysis is a method to quantify the pattern of crystallographic preferred orientation in polycrystalline materials like metals, rocks or ceramics. The course will cover: 1. A brief introduction into the basic mathematics of practical texture analysis from the point of view of Radon transforms and computer tomography. 2. An extensive introduction into the free and open source Matlab® toolbox MTEX (http://code.google.com/p/mtex/) to compute an orientation density function (odf) from experimental pole intensity data, e.g., area detector data, and its characteris-tic properties as harmonic coefficients, texture index, mode, volume portions, etc. Attendees are asked to bring their own laptop, if possible equipped with a recent MATLAB® license to do hands-on exercises by themselves. Polymers - Full Day Organizers & Instructors: S. Murthy, Rutgers University, Piscataway, NJ, murthy@biology.rutgers.edu B. Landes, Dow Chemical Company, Midland, MI, bglandes@dow.com C. Burger, SUNY – Stony Brook, Stony Brook, NY J. Ilavsky, Advance Photon Source/Argonne National Laboratory, Argonne, IL G. Beaucage, University of Cincinnati, Cincinnati, OH B. Lee, Advance Photon Source/Argonne National Laboratory, Argonne, IL Small-angle X-ray scattering (SAXS) is a well established technique in many areas (biology, materials science, metallurgy, polymer and colloid physics) for analyzing structures at the colloidal length scale (10-100’s nm). It is a powerful metrology technology that can be used to describe the size, size distribution, shape, density, volume fraction, order/disorder, and interfaces of moieties in multiphase systems. The workshop will discuss SAXS theory, instrumentation, data analysis / interpretation, and structural modeling. The presenters will discuss examples from the field of polymers, ceramics, biological systems, and particulate materials. Software packages that can be used in the analysis of the data and specific analysis methods will be described. A relatively new technique for the analysis of long-range structure near surfaces, grazing incidence SAXS (GISAXS) will be discussed. Each of the lectures will cover specific means of data collection, the models used to interpret the data, and the techniques for analyzing the data to get meaningful information. Specific topics that are of broad interest and falling within the scope can be submitted in advance for consideration to murthy@biology.rutgers.edu. Survey of Basic XRD Applications Organizer & Instructors: S.T. Misture, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu T.N. Blanton, Eastman Kodak Company Research Labs, Rochester, NY M.A. Rodriguez, Sandia National Laboratories, Albuquerque, NM This ½ day workshop will survey various applications of XRD analysis, including in situ analyses and neutron diffraction. The analyses will include phase ID, crystallite size and microstrain, preferred orientation and texture, lattice parameters and solid solutions, and residual stress. Brief overviews of high-temperature in situ analysis, neutron diffraction and synchrotron studies will be included. Two-Dimensional Detectors Organizers & Instructors: T.N. Blanton, Eastman Kodak Company Research Labs, Rochester, NY, thomas.blanton@kodak.com B.B. He, Bruker AXS Inc., Madison, WI, bob.he@bruker-axs.com P. Salficky, DECTRIS Ltd., Baden, Switzerland M. Fransen, PANalytical B.V., Almelo, The Netherlands J. Ferrara, Rigaku Americas Corporation, The Woodlands, TX Two-dimensional diffraction data contains abundant information about the atomic arrangement, microstructure, and defects of a solid or liquid material. In recent years, the use of two-dimensional detectors has dramatically increased in academic, government and industrial laboratories. This workshop covers recent progress in two-dimensional X-ray diffraction in terms of detector technology, geometry and configuration of the two-dimensional diffractometer. Various applications, such as phase ID, texture, stress, crystallinity, combinatorial screening, and thin film analysis will be discussed. Pair Distribution Function Organizer: V. Petkov, Central Michigan University, Mt. Pleasant, MI, petkov@phy.cmich.edu This workshop will provide a brief refresher on the PDF’s fundamentals and hands-on training on experimental XRD data, both in-house and synchrotron, reduction into PDFs as well as fitting of structure models to experimental PDFs. Attendees are encouraged to bring laptops and data sets of their own. XRF Basic XRF Organizer & Instructors: W.T. Elam, Ametek/EDAX Research Group and University of Washington APL, Seattle, WA, wtelam@apl.washington.edu G. Havrilla, Los Alamos National Laboratory, Los Alamos, NM This workshop provides a basic introduction to the principles of XRF, and is specifically aimed at those new to the field. It will start with a general overview of the technique, followed by more specific details of the basic principles. The emphasis will be on understanding how to use XRF and what its capabilities are. In the second half of the workshop, a few selected applications will be presented. The focus of this segment will be to provide an understanding of how the basic principles affect actual practice. Trace Analysis Organizer & Instructors: M.A. Zaitz, IBM, Hopewell Junction, NY, zaitz@us.ibm.com Instructors and description to be announced XRF Specimen Preparation Organizer & Instructors: J. Anzelmo, Anzelmo & Associates, Inc., Madison, WI, jaanzelmo@aol.com M. Loubser, PCC Cement, Johannesburg, South Africa L. Ottmar, Millennium Inorganic Chemicals, A Cristal Company, Glen Burnie, MD This workshop will cover the basics of XRF sample preparation including sampling techniques and equipment needed, preparation of powder briquettes and fusion beads, and the techniques and equipment used for manual and automated methods. Fusion techniques will include both borate and peroxide methods. Materials to be covered include geological, mining, cement and associated materials (Loubser), and products and raw materials used in the titanium oxide industry (Ottmar). Quantitative Analysis — Full day Organizer & Instructors: M. Mantler, Purkersdorf, Austria, michaelmantler@aon.at B. Vrebos, PANalytical B.V., Almelo, The Netherlands W.T. Elam, Ametek/EDAX Research Group and University of Washington APL, Seattle, WA Morning: Basic methods of quantitative analysis: 1. Theoretical and mathematical foundation: Classical fundamental parameter models. 2. Practical application: Working curves and influence coefficients, compensation methods. Afternoon: Advanced methods of quantitative analysis: 1. Interpretation of spectra and full spectrum modeling. 2. Coherent and incoherent scattering. 3. Analysis of thin films/layers. Standards and Advanced Sample Preparation For XRF Analysis Organizer & Instructors: K. Tsuji, Osaka City University, Osaka, Japan, tsuji@a-chem.eng.osaka-cu.ac.jp K. Nakano, Osaka City University, Osaka, Japan U. Fittschen, University of Hamburg, Hamburg, Germany B. Beckhoff, Physikalisch-Technische Bundesanstalt, Berlin, Germany This workshop will introduce standard materials for quantitative XRF analysis of trace or major elements in metals, plastics, soils, and other matrices. The emphasis will be on understanding how to prepare the calibration standards as well as reference-free XRF analysis. A demonstration, on how to evaluate analytical performance of micro-XRF by using micro structured materials, will be provided. Additionally, the workshop will include a discussion on sample preparation using pico-droplets and pre concentration techniques, which are useful for trace analysis techniques such as TXRF. Sessions Wednesday, Thursday & Friday, 4–6 August The exact date and time of each session will not be determined until April 2010. The conference ends at 12 noon on Friday, 6 August. PLENARY SESSION: The Greening of X-rays: X-rays and Renewable Energy Chairs: R.L. Snyder, Georgia Institute of Technology, Atlanta, GA, bob.snyder@mse.gatech.edu B. Toby, APS, Argonne National Laboratory, Argonne, IL, brian.toby@anl.gov Investigations of the Defect Structure of Transparent Conductors Using X-ray and Neutron Scattering Techniques Gabriela B. González Avilés, DePaul University, Department of Physics, Chicago, IL In-situ Diffraction: An Important Tool for the Development of Renewable Energy Technologies Mark A. Rodriguez, Sandia National Laboratories, Albuquerque, NM Unraveling the Inner Workings of Energy-related Materials Using In-situ X-ray Absorption Techniques Faisal Alamgir, Georgia Institute of Technology, Materials Science & Engineering, Atlanta, GA Insights into Thermoelectric Materials: New Structures and Properties Paul Zschack, Advanced Photon Source, Argonne National Laboratory, Argonne, IL XRD AND XRF New Developments in XRD & XRF Instrumentation Chair: T. Fawcett, International Centre for Diffraction Data, Newtown Square, PA, fawcett@icdd.com Abstracts should be submitted by technical representatives of a manufacturer. They should discuss specifications, and applications concerning one of their newest and most important products. Talks should include comments about software, XRD and XRF equipment, and accessories. No mention of prices or a comparison with competitors' products can be included. Cultural Heritage — Full Day Chairs: M. Walton, Getty Conservation Institute, Los Angeles, CA, mwalton@getty.edu K. Eremin, Harvard Art Museum, Cambridge, MA, katherine_eremin@harvard.edu Confocal XRF and Its Application to Ceramics J. Mass, Winterthur Museum and Country Estate, Winterthur, DE Synchrotron XRF Analysis of Works of Art A. Mehta, Stanford Synchrotron Radiation Lightsource (SSRL), Menlo Park, CA Analysis of Meissen Porcelain Glazes and Bodies A. Shortland, Cranfield University, Shrivenham, UK Probing Catalysts with X-ray Absorption Spectroscopy Chairs: C. Segre, Illinois Institute of Technology, Chicago, IL, segre@iit.edu M. Newville, Univ. of Chicago/Argonne National Lab, Argonne, IL, newville@cars.uchicago.edu B. Ravel, NIST, Gaithersburg, MD, bruce.ravel@nist.gov Invited speakers to be announced XRD Stress Analysis Chairs: C. Goldsmith, IBM, Hopewell Junction, NY, cgoldsmi@us.ibm.com T. Watkins, Oak Ridge National Laboratory, Oak Ridge, TN, watkinstr@ornl.gov Commissioning Results and New Scientific Opportunities at Vulcan – The SNS Materials Science and Engineering Diffractometer K. An, Oak Ridge National Laboratory, Oak Ridge, TN Thermo-mechanical Behavior of Thin Films and Small Structures Characterized by X-ray Diffraction J. Keckes, University of Leoben, Leoben, Austria Title to be announced R. Rogge, Steacie Institute for Molecular Science, Chalk River Laboratories, Chalk River, Ontario, Canada Polymers/SAX — Full Day Chairs: S. Murthy, Rutgers University, Piscataway, NJ, murthy@biology.rutgers.edu B. Landes, Dow Chemical Company, Midland, MI, bglandes@dow.com Disorder in a Fiber: RDF Analysis on an Oriented System D. Londono, DuPont Company, Wilmington, DE Transient Microstructure of Thermoplastic Polyurethane Nanocomposites Under Uniaxial Deformation H. Koerner, Nanostructured and Biological Materials Branch, Air Force Research Labs, Wright-Patterson AFB, OH In-situ and Time Resolved SAXS B. Landes, Dow Chemical Company, Midland, MI Analysis of 2D SAXS Patterns from Oriented Systems S. Murthy, Rutgers University, Piscataway, NJ Micro Diffraction Chair: C. Murray, IBM, T.J. Watson Research Center, Yorktown Heights, NY, conal@us.ibm.com Nanoscale Scanning Probe Diffraction Microscopy at the CNM/APS Hard X-ray Nanoprobe Beamline M.V. Holt, Advanced Photon Source, Argonne National Laboratory, Argonne, IL Three Dimensional X-ray Diffraction Microscopy L. Margulies, National Synchrotron Light Source 2, Brookhaven National Laboratory, Upton, NY Rietveld Analysis Chairs: J. Kaduk, Poly Crystallography Inc., Naperville, IL, kaduk@polycrystallography.com S.T. Misture, NYS College of Ceramics at Alfred University, Alfred, NY, misture@alfred.edu High-resolution Powder X-ray Diffraction Study of Complex Minerals S. Antao, University of Calgary, Calgary, Alberta, Canada Mile High Resolution XRD Chair: K. Evans-Lutterodt, Brookhaven National Laboratory, Upton, NY, kenne@bnl.gov Invited speakers to be announced XRF Fusion and Industrial Applications of XRF Chair: J.A. Anzelmo, Anzelmo & Associates, Inc., Madison, WI, jaanzelmo@aol.com Applications of XRF in CRM Development at the National Institute of Standards and Technology J. Sieber, National Institute of Standards and Technology, Gaithersburg, MD XRF Applications in the Titanium Oxide Industry L. Ottmar, Millennium Inorganic Chemicals, A Cristal Company, Glen Burnie, MD Environmental and Handheld XRF Chairs: J.A. Anzelmo, Anzelmo & Associates, Inc., Madison, WI, jaanzelmo@aol.com R. Van Grieken, University of Antwerp, Antwerp, Belgium, rene.vangrieken@ua.ac.be Title to be announced A. Karydas, International Atomic Energy Agency, Vienna, Austria Title to be announced J. Boman, University of Gothenburg, Sweden Title to be announced E. Margui, Institute of Earth Science ‘Jaume Almera’, Barcelona, Spain Trace Analysis Chair: M.A. Zaitz, IBM, Hopewell Junction, NY, zaitz@us.ibm.com Invited speakers to be announced X-ray Imaging Chair: G.J. Havrilla, Los Alamos National Laboratory, Los Alamos, NM, havrilla@lanl.gov X-ray Chemical Imaging in Scanning and Projection Modes in the Laboratory K. Tsuji, Graduate School of Engineering, Osaka City University, Osaka, Japan Imaging of High-Intensity Discharges with Applications to Energy-Efficient Lighting J. Curry, National Institute of Standards and Technology, Gaithersburg, MD Quantitative Analysis Chair: W.T. Elam, Ametek/EDAX Research Group and Univ. of Washington APL, Seattle, WA, wtelam@apl.washington.edu Analytical Strategy for Compositional and Layer Thickness Analysis of Copper-Indium-Gallium-Selenium on Molybdenum Coated Glass Substrates L. Brehm, Dow Chemical Company, Midland, MI http://www.dxcicdd.com/10/callforpapers.htm [ Last edited by 纳米镍粉 on 2010-4-19 at 22:39 ] |
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