| ²é¿´: 336 | »Ø¸´: 2 | |||
| µ±Ç°Ö÷ÌâÒѾ´æµµ¡£ | |||
| ¡¾Óн±½»Á÷¡¿»ý¼«»Ø¸´±¾Ìû×Ó£¬²ÎÓë½»Á÷£¬¾ÍÓлú»á·ÖµÃ×÷Õß lalahulala µÄ 3 ¸ö½ð±Ò | |||
lalahulalaľ³æ (ÕýʽдÊÖ)
|
[½»Á÷]
¡¾ÇóÖú¡¿Ò».µ¥¾§¹è±íÃæÈçºÎ»ñµÃ½ÏºñµÄSiO2²ã¶þ.¹ØÓÚÐýתͿĤ
|
||
|
ÎÒÓÃŨÁòËᡢ˫ÑõË®¼ÓÈÈ´¦Àíµ¥¾§¹èƬ¼¸¸öСʱºó¸úÔÆ¬µç×èÂÊÃ»Ê²Ã´Çø±ðѽ¡£Ê²Ã´·½·¨Äܹ»µÃµ½½ÏºñµÄSiO2²ã ÁíÍ⣬ÈÈÑõ»¯·¨ÎÒ»¹Ã»ÊÔ£¬×ö¹ýµÄxdjmÖ¸µãһϣ¬¶àлÁË »¹ÓоÍÊÇÎÒÏëÔÚ²£Á§»òÊÇ¹èÆ¬ÉÏÐýתͿĤ£¬²»ÖªµÀÓÃʲôÈܼÁÈóʪÐԺã¬Í¿³öÀ´µÄĤ¾ùÔÈ |
» ²ÂÄãϲ»¶
22408£¬264Çóµ÷¼Á
ÒѾÓÐ3È˻ظ´
294Çóµ÷¼Á
ÒѾÓÐ6È˻ظ´
283·ÖÇóµ÷¼Á
ÒѾÓÐ6È˻ظ´
Çóµ÷¼Á
ÒѾÓÐ3È˻ظ´
²ÄÁϵ÷¼Á
ÒѾÓÐ6È˻ظ´
26¿¼Ñе÷¼Á0710 0860
ÒѾÓÐ4È˻ظ´
353Çóµ÷¼Á
ÒѾÓÐ4È˻ظ´
278Çóµ÷¼Á
ÒѾÓÐ4È˻ظ´
281Çóµ÷¼Á
ÒѾÓÐ9È˻ظ´
²ÄÁÏ¿ÆÑ§Ó빤³Ì¿¼ÑÐ
ÒѾÓÐ8È˻ظ´
bryano
ľ³æ (ÕýʽдÊÖ)
- Ó¦Öú: 51 (³õÖÐÉú)
- ½ð±Ò: 1554.1
- ºì»¨: 3
- Ìû×Ó: 588
- ÔÚÏß: 82.4Сʱ
- ³æºÅ: 420812
- ×¢²á: 2007-07-14
- רҵ: Äý¾Û̬ÎïÐÔ II £ºµç×ӽṹ
¡ï
lalahulala(½ð±Ò+1,VIP+0):¶àл£¬ÎÒÏÖÔÚÕýÔÚÉÕ£¬¸ÉÑõ£¬Ô¤µÃµ½200ÄÉÃ×ÒÔÉϵÄSiO2¡£Áí£¬ÎÒÓÃÈܼÁ½«ÓлúǰÇûÌåÈܽâµÃµ½ÈÜÒº£¬ÐýתͿĤȻºóÔÙÈȽ⣬µÃµ½Ñõ»¯ÎïĤ 8-26 15:57
lalahulala(½ð±Ò+1,VIP+0):¶àл£¬ÎÒÏÖÔÚÕýÔÚÉÕ£¬¸ÉÑõ£¬Ô¤µÃµ½200ÄÉÃ×ÒÔÉϵÄSiO2¡£Áí£¬ÎÒÓÃÈܼÁ½«ÓлúǰÇûÌåÈܽâµÃµ½ÈÜÒº£¬ÐýתͿĤȻºóÔÙÈȽ⣬µÃµ½Ñõ»¯ÎïĤ 8-26 15:57
|
Ö±½ÓÔÚ¿ÕÆøÖÐÉÕ²»¾ÍµÃµ½SiO2²ãÁË£¬¼¸Ê®nmºñ»¹²»¹»Â𣿠˦½ºÒª¿´Äã×öʲôĤÁË¡£ |
2Â¥2009-08-26 14:24:37
There is always a layer of SiO2 on Si wafers if you put them in the air.
¡ï
lalahulala(½ð±Ò+1,VIP+0):Thank you! I have got it by heating them in O2 at 1000 ¡æ. 9-4 09:05
lalahulala(½ð±Ò+1,VIP+0):Thank you! I have got it by heating them in O2 at 1000 ¡æ. 9-4 09:05
|
it can be told by hydrophilicity. you can also deposit a layer of SiO2 on the top of your wafer. |
3Â¥2009-09-03 22:58:37














»Ø¸´´ËÂ¥