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¶þÉóµÄÉó¸åÒâ¼û»ØÀ´£¬±à¼ÖØÐÂËÍÁ˵ÚËĸöÉó¸åÈË £¬¸ÃÉó¸åÈËÊǸö (Crystallographic Reviewer)£¬Ìá³öÁËÁ½¸ö¾§Ìå·½ÃæµÄÒâ¼û£¬Ð¡µÜ²»ÖªµÀɶÒâ˼£¬Ò²²»ÖªµÀÔõô¸Ä£¬Íû´óÉñÖ¸½Ì£º 1. Difference-map plots made with the author-supplied data show that the various H atoms in the two components appear to be correctly placed. 2. We see from the CIF that the solvent-masking routine in Olex-2 [equivalent to SQUEEZE in PLATON] was used to remove the contributions of unspecified disordered components from the structure factor list. We are nowhere told about this in text or ESI material (and we should be), although the authors have appended the CIF-format-output from Olex-2 (generated as _smtbx_masks_special_details ) to the CIF from which we see that the contributions of some 58 electrons were removed from the unit-cell contents. With Z = 4 in this case, this is equivalent to the removal of 58/4 = 14.5 electrons from the formula unit. If the disordered component was ethanol, this could correspond with ~ 0.6(C~2~H~6~O) being added to the formula unit. The contribution of any disordered component removed by the masking process should be included in the overall formula, formula weight, density, F(000), etc., calculations reported in the crystal-data text and in the CIF. This should now be done and we should also be explicitly told in the experimental text what (and the amount of) disordered material that was removed from the formula unit by the masking process in the _smtbx_masks_special_details text of the revised CIF.@lich666@jackdeng |
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