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Dry etching characteristics of Mo and Al2O3 films in O2/Cl2/Ar inductively coupled plasmas Kwang-HoKwon, AlexanderEfremov, Sun JinYun, InwooChun, KwangsooKim ¡¶Thin Solid Films¡· Volume 552, 3 February 2014, Pages 105-110 |
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