| 查看: 884 | 回复: 9 | ||
| 【奖励】 本帖被评价9次，作者lihai0910增加金币 7.5 个 | ||
| 当前主题已经存档。 | ||
| 当前只显示满足指定条件的回帖，点击这里查看本话题的所有回帖 | ||
[资源]
Chemical Vapour Deposition: Precursors, Processes and Applications Edition
|
||
|
By Anthony C. Jones, Michael L. Hitchman Publisher: Royal Society of Chemistry Number Of Pages: 675 Publication Date: 2009-01 ISBN-10 / ASIN: 0854044655 ISBN-13 / EAN: 9780854044658 Binding: Hardcover Product Description: The book is one of the most comprehensive overviews ever written onthe key aspects of chemical vapour deposition processes and it is morecomprehensive, technically detailed and up-to-date than other books onCVD. The contributing authors are all practising CVD technologists andare leading international experts in the field of CVD. It presents alogical and progressive overview of the various aspects of CVDprocesses. Basic concepts, such as the various types of CVD processes,the design of CVD reactors, reaction modelling and CVD precursorchemistry are covered in the first few chapters. Then follows adetailed description of the use of a variety CVD techniques to deposita wide range of materials, including semiconductors, metals, metaloxides and nitrides, protective coatings and functional coatings onglass. Finally and uniquely, for a technical volume, industrial andcommercial aspects of CVD are also discussed together with possiblefuture trends, which is an unusual, but very important aspect of thebook. http://www.namipan.com/d/Chemical%20Vapour%20Deposition%20Precursors_%20Processes%20and%20Applications%20Edition.rar/a426b1b9a311bc5ebd4c3ecd20b11cd38d2155ca56feed04 [ Last edited by lihai0910 on 2008-12-21 at 14:09 ] |
回复此楼» 猜你喜欢
[武汉纺织大学]材料学院[姜伟团队名称]课题组-2026年硕士研究生调剂信息
已经有0人回复
-
中国科学院·过程工程研究所·招聘海内外高层次人才---过程所“百人计划”
已经有1人回复
-
有机高分子材料论文润色/翻译怎么收费?
已经有82人回复
-
中国科学院·过程工程研究所·招聘海内外高层次人才---过程所“百人计划”
已经有5人回复
-
2026考博自荐
已经有4人回复
-
温敏水凝胶收缩
已经有0人回复
-
PDMS膜在溶液中的离子透过率
已经有0人回复
-
攒人品 论文祈福
已经有139人回复
-
science advances的AAAS系统上返修
已经有0人回复
-
science advances的AAAS系统上返修问题
已经有2人回复
-
LDPE黑十字为什么那么大
已经有0人回复
10楼2008-12-24 16:21:33
2楼2008-12-21 14:18:28
3楼2008-12-21 17:25:53
7楼2008-12-23 10:28:07
20