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[资源]
Chemical Vapour Deposition: Precursors, Processes and Applications Edition
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By Anthony C. Jones, Michael L. Hitchman Publisher: Royal Society of Chemistry Number Of Pages: 675 Publication Date: 2009-01 ISBN-10 / ASIN: 0854044655 ISBN-13 / EAN: 9780854044658 Binding: Hardcover Product Description: The book is one of the most comprehensive overviews ever written onthe key aspects of chemical vapour deposition processes and it is morecomprehensive, technically detailed and up-to-date than other books onCVD. The contributing authors are all practising CVD technologists andare leading international experts in the field of CVD. It presents alogical and progressive overview of the various aspects of CVDprocesses. Basic concepts, such as the various types of CVD processes,the design of CVD reactors, reaction modelling and CVD precursorchemistry are covered in the first few chapters. Then follows adetailed description of the use of a variety CVD techniques to deposita wide range of materials, including semiconductors, metals, metaloxides and nitrides, protective coatings and functional coatings onglass. Finally and uniquely, for a technical volume, industrial andcommercial aspects of CVD are also discussed together with possiblefuture trends, which is an unusual, but very important aspect of thebook. http://www.namipan.com/d/Chemical%20Vapour%20Deposition%20Precursors_%20Processes%20and%20Applications%20Edition.rar/a426b1b9a311bc5ebd4c3ecd20b11cd38d2155ca56feed04 [ Last edited by lihai0910 on 2008-12-21 at 14:09 ] |
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