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[ÇóÖú] ÖÆ±¸fluidFM tip Óöµ½µÄÎÊÌâ

±¾³æ±¦±¦×î½üÔÚ×öfluidFM tipµÄÖÆ±¸¡£ÀûÓÃTMAH¸¯Ê´polysilicon scarifical layerÀ´»ñÈ¡microfulid channel.¿ÉÊÇÔÚ¸¯Ê´Ö®ºóµÄÇå½àºÍ¸ÉÔïµÄ¹ý³Ì£¬Ò»Ö±Óöµ½ÁËÄÉÃ׿׶ÂÈûµÄÎÊÌâ¡£ÈçÏÂͼËùʾ£¬ÓÐÏà¹ØÁìÓòµÄ´óÉñ¸øµãÒâ¼ûÂ𣿠ÒѾ­³¢ÊÔÁ˸ı丯ʴµÄζȡ£ Ìí¼ÓIPA£¬¿ÉÊÇЧ¹û¶¼²»Ã÷ÏÔ¡£Çó´óÉñÖ¸½Ì.

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The  probe  is  fabricated  by  the  surface  micromachining  using  a  sacrificial  polysilicon  technique.  In  this  technique  a sacrificial polysilicon layer, enclosed by the silicon nitride walls, is removed by wet chemical etching in alkaline solution (TMAH) to obtain a microfluidic channel.  It is of paramount importance to clean the wafer properly  after the sacrificial etching in order to remove any residue from the microchannel in order to prevent clogging of the nanoscale aperture.   

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