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[求助] 论文审稿意见中关于CVs表面控制过程的问题求助已有1人参与

论文中有一段关于CVs的描述：
在扫速为20 mV s-1时，氧化还原峰电位差60 mV，表面反应为快速的电子转移过程。扫速20 mV s-1到200 mV s-1增加，氧化峰电流和还原峰电流均与扫速呈线性增加，表明surface-controlled electrochemical process。
结果审稿意见为：
First of all, a theoritical peak separation of 0mV is expected for a fast and reversible surface-confined process (see Bard and Faulkner). A peak separation of 60 mV would suggest a diffusion controlled process. However, a linear current dependance towards scan rate is indicative of a surface -controlled process.
A peak-to-peak separation of 60 mV for a surface-confined process is high as compared to the theoretical 0 mV. The electron transfer can therefore not be considered as "rapid and reversible". Could the authors modify the discussion?

如何修改，请赐教！

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