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求翻译一小段英文 已有2人参与
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We developed a postgrowth modification method of two-dimensional WO3 nanoflakes by a simultaneous solution etching and reducing process in a weakly acidic condition. The obtained dual etched and reduced WO3 nanoflakes have a much rougher surface, in which oxygen vacancies are created during the simultaneous etching/reducing process for optimized photoelectrochemical performance. The obtained photoanodes show an enhanced photocurrent density of∼1.10 mA/cm2 at 1.0 V vs Ag/AgCl (∼1.23 V vs reversible hydrogen electrode), compared to 0.62 mA/cm2 of pristine WO3 nanoflakes. The electrochemical impedance spectroscopy measurement and the density functional theory calculation demonstrate that this improved performance of dual etched and reduced WO3 nanoflakes is attributed to the increase of charge carrier density as a result of the synergetic effect of etching and reducing. |
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wang342901
禁虫 (初入文坛)
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空位: 金币-10, 屏蔽内容, 违规存档, 屏蔽内容, 违规存档, 违规广告 2016-03-02 15:06:39
空位: 金币-10, 屏蔽内容, 违规存档, 屏蔽内容, 违规存档, 违规广告 2016-03-02 15:06:39
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2楼2016-03-02 10:29:27
zkdq
木虫 (知名作家)
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| 我们由蚀刻和减少进程在弱的酸性条件下的联立求解二维 WO3nanoflakes postgrowth 改性方法。获得双重蚀刻和减少 WO3 纳米片有很多粗糙的表面，在 which oxygen 在 optimizedphotoelectrochemical 性能的同时减少刻蚀/过程中创建的空缺。获得光阳极在 1.0 V vs 银/氯化银 (～1.23 V vs 可逆氢电极)，相比于 0.62 马/cm2 的原始 WO3 纳米片显示增强的 photocurrentdensity of～1.10 mA/cm2。电化学阻抗谱法所得的密度泛函理论计算表明，这提高协同效应的蚀刻和减少电荷载流子密度的增加双重蚀刻和减少 WO3 纳米片 isattributed 的性能。 |
3楼2016-03-02 16:07:19