| ²é¿´: 517 | »Ø¸´: 1 | ||
| ¡¾ÐüÉͽð±Ò¡¿»Ø´ð±¾ÌûÎÊÌ⣬×÷Õßchuandanwei½«ÔùËÍÄú 10 ¸ö½ð±Ò | ||
chuandanweiľ³æ (ÖøÃûдÊÖ)
|
[ÇóÖú]
ÇëÎʹúÄÚÄĸö¿ÆÑлú¹¹ÓÐÄÉÃ×¼Ó¹¤ÊµÑéÊÒ£¿ ÒÑÓÐ1È˲ÎÓë
|
|
| ÒªÇóÄÜ×öÒÔÏÂÕâЩ¹¤×÷Photolithography¡¢Reactive Ion Etching£¨RIE£©¡¢Plasma Enhanced Chemical Vapor Deposition (PECVD)¡¢Focused Ion Beam (FIB) Milling |
» ²ÂÄãϲ»¶
332Çóµ÷¼Á
ÒѾÓÐ5È˻ظ´
085701Çóµ÷¼Á³õÊÔ286·Ö
ÒѾÓÐ3È˻ظ´
²ÄÁϹ¤³Ì294Çóµ÷¼Á
ÒѾÓÐ4È˻ظ´
±¾¿ÆÐÂÄÜÔ´¿ÆÑ§Ó빤³Ì£¬Ò»Ö¾Ô¸»ªÀíÄܶ¯285Çóµ÷¼Á
ÒѾÓÐ10È˻ظ´
070305¸ß·Ö×Ó»¯Ñ§ÓëÎïÀí 304·ÖÇóµ÷¼Á
ÒѾÓÐ5È˻ظ´
083000ѧ˶274Çóµ÷¼Á
ÒѾÓÐ8È˻ظ´
Ò»Ö¾Ô¸±±¾©»¯¹¤´óѧ²ÄÁÏÓ뻯¹¤£¨085600£©296Çóµ÷¼Á
ÒѾÓÐ10È˻ظ´
Çóµ÷¼ÁÒ»Ö¾Ô¸º£´ó£¬0703»¯Ñ§Ñ§Ë¶304·Ö£¬Óдó´´ÏîÄ¿£¬Ëļ¶Òѹý
ÒѾÓÐ11È˻ظ´
071000ÉúÎïѧÇóµ÷¼Á£¬³õÊԳɼ¨343
ÒѾÓÐ7È˻ظ´
0703»¯Ñ§µ÷¼Á£¬Çóµ¼Ê¦ÊÕ
ÒѾÓÐ8È˻ظ´
» ±¾Ö÷ÌâÏà¹ØÉ̼ÒÍÆ¼ö: (ÎÒÒ²ÒªÔÚÕâÀïÍÆ¹ã)
physics123
Òø³æ (СÓÐÃûÆø)
- Ó¦Öú: 1 (Ó×¶ùÔ°)
- ½ð±Ò: 615.1
- Ìû×Ó: 167
- ÔÚÏß: 50.7Сʱ
- ³æºÅ: 298579
- ×¢²á: 2006-11-19
- רҵ: µÈÀë×ÓÌåÎïÀí
2Â¥2016-01-07 19:27:41














»Ø¸´´ËÂ¥