Chem. Soc. Rev.最新综述:二维层状硫属化合物的输运物理和迁移率优化 (入选期刊封面)
Charge transport and mobility engineering in two-dimensional transition metal chalcogenide semiconductors
Song-Lin Li, Kazuhito Tsukagoshi, Emanuele Orgiu and Paolo Samori
http://dx.doi.org/10.1039/C5CS00517E
Abstract:Two-dimensional (2D) van der Waals semiconductors represent the thinnest, air stable semiconducting materials known. Their unique optical, electronic and mechanical properties hold great potential for harnessing them as key components in novel applications for electronics and optoelectronics. However, the charge transport behavior in 2D semiconductors is more susceptible to external surroundings (e.g. gaseous adsorbates from air and trapped charges in substrates) and their electronic performance is generally lower than corresponding bulk materials due to the fact that the surface and bulk coincide. In this article, we review recent progress on the charge transport properties and carrier mobility engineering of 2D transition metal chalcogenides, with a particular focus on the markedly high dependence of carrier mobility on thickness. We unveil the origin of this unique thickness dependence and elaborate the devised strategies to master it for carrier mobility optimization. Specifically, physical and chemical methods towards the optimization of the major factors influencing the extrinsic transport such as electrode/semiconductor contacts, interfacial Coulomb impurities and atomic defects are discussed. In particular, the use of ad hoc molecules makes it possible to engineer the interface with the dielectric and heal the vacancies in such materials. By casting fresh light on the theoretical and experimental studies, we provide a guide for improving the electronic performance of 2D semiconductors, with the ultimate goal of achieving technologically viable atomically thin (opto)electronics.
1 Introduction
2 Basic material properties
2.1 Atomic structure
2.2 Lattice phonon modes
2.3 Band structure and electrical permittivity
3 Electronic performance at early times (with slight or without mobility engineering)
3.1 Thickness dependence
3.2 Temperature dependence
3.3 Dependence of the electronic phase on carrier density
4 Factors related to electronic transport
4.1 Electrode/semiconductor contacts
4.1.1 Schottky barrier and Fermi pinning
4.1.2 Current crowding effect
4.2 Carrier scattering mechanisms
4.2.1 Interfacial impurities
4.2.2 Deformation potential
4.2.3 Frohlich and piezoelectric interactions
4.2.4 Remote interfacial phonons
4.2.5 Atomic and structural defects
4.2.6 Other scattering mechanisms
5 Mobility engineering strategies and state-of-the-art performance
5.1 Contact optimization
5.2 Reduction of impurity scattering
5.3 Dielectric screening versus RIP scattering
5.4 Atomic vacancy healing
5.5 State-of-the-art performance
6 Experimental traps and standards
6.1 Mobility overestimation in a dual-gated structure
6.2 Four-terminal measurement
6.3 Barrier height extraction by thermionic emission
7 Summary and outlook