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[资源] 2015年新著——先进平版印刷术的进展（英文版）

"Updates in Advanced Lithography" ed. by Sumio Hosaka
Second Edition
ITAe| 2015 | ISBN: 9535111752 | 260 pages | PDF | 24 MB

This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device.
One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer.
In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc.

Contents
Preface
Section 1 Lithography for 3D Structure and Nano Scale
1 Colloidal Lithography
2 Recent Advances in Two-Photon Stereolithography
3 Femtosecond Laser Lithography in Organic and Non-Organic Materials
4 Three-Dimensional Lithography Using Combination of Nanoscale Processing and Wet Chemical Etching
5 Combination of Lithography and Coating Methods for Surface Wetting Control
Section 2 Resist
6 Resist Homogeneity
Section 3 Nanoimprint
7 Soft UV Nanoimprint Lithography and Its Applications
8 Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography
Section 4 Fabrication of 3D Nano-Structure
9 The Fabrication of High Aspect Ratio Nanostructures on Quartz Substrate
10 Fabrication of 3D Micro- and Nano-Structures by Prism-Assisted UV and Holographic Lithography

ITAe| 2015 | ISBN: 9535111752 | 260 pages | PDF | 24 MB

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Pureland

木虫之王 (知名作家)

应助: 1516 (讲师)
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