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Cambridge2011Physics of Radio-Frequency Plasmas
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Introduction 1 1.1 Plasmas 1 1.2 Plasma processing for microelectronics 3 1.3 Plasma propulsion 9 1.4 Radio-frequency plasmas: E, H and W-modes 14 1.5 What lies ahead 17 2 Plasma dynamics and equilibrium 18 2.1 The microscopic perspective 19 2.2 The macroscopic perspective 37 2.3 Global particle and energy balance 41 2.4 The electrodynamic perspective 45 2.5 Review of Chapter 2 55 3 Bounded plasma 59 3.1 The space charge sheath region 61 3.2 The plasma/sheath transition 72 3.3 The plasma region: transport models 78 3.4 Review of Chapter 3 90 4 Radio-frequency sheaths 96 4.1 Response times 97 4.2 Ion dynamics 102 4.3 Electron dynamics 110 4.4 Analytical models of (high-frequency) RF sheaths 116 4.5 Summary of important results 130 5 Single-frequency capacitively coupled plasmas 131 5.1 A constant ion density, current-driven symmetrical model 133 5.2 A non-uniform ion density, current-driven model 146 v vi Contents 5.3 Global model 154 5.4 Other regimes and configurations 165 5.5 Summary of important results 174 6 Multi-frequency capacitively coupled plasmas 176 6.1 Dual-frequency CCP in the electrostatic approximation 177 6.2 Electromagnetic regime at high frequency 187 6.3 Summary of important results 218 7 Inductively coupled plasmas 219 7.1 Electromagnetic model 222 7.2 Impedance of the plasma alone 233 7.3 The transformer model 236 7.4 Power transfer efficiency in pure inductive discharges 241 7.5 Capacitive coupling 243 7.6 Global model 246 7.7 Summary of important results 252 7.8 Further considerations 253 8 Helicon plasmas 260 8.1 Parallel propagation in an infinite plasma 264 8.2 Helicon wave propagation in a cylinder 268 8.3 Conditions for existence of the helicon modes 276 8.4 Wave power absorption: heating 277 8.5 E–H–W transitions 283 8.6 Summary of important results 286 9 Real plasmas 287 9.1 High-density plasmas 288 9.2 Magnetized plasmas 293 9.3 Electronegative plasmas 298 9.4 Expanding plasmas 313 10 Electrical measurements 318 10.1 Electrostatic probes 319 10.2 Electrostatic probes for RF plasmas 340 10.3 A retarding field analyser (RFA) 348 10.4 Probing with resonances and waves 354 10.5 Summary of important results 365 Appendix: Solutions to exercises 368 References 375 Index 383 |
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