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Polyamide acid with high molecular weight is the premise of obtaining high performance, because the formation of polyimide is obtained by the dehydration and cyclization of polyamide acid. In this paper, the factors affecting the synthesis of polyamide acid and polyamide acid ester were discussed and the best process conditions on the synthesis of polyamide acid with high molecular weight were obtained.
In the route of designing the experiment, 4,4`-diaminodiphenyl ether (ODA) and pyromellitic dianhydride£¨PMDA£©were used as monomers of copolymerization, N-methyl-2-pyrrolidone (NMP) as solvent, Polyamide acid(PAA) was synthesized by changing the reaction conditions.
The PAA was characterized by the determination of IR and viscosity and so on. The best reaction conditions were obtained finally. Then the photosensitive polyamide acid ester(PAE) was synthesized by the esterification and used as the prepolymer of UV curing materials.
Key words: polyimide, photosensitive polyamide acid, 4,4`-diaminodiphenyl ether, pyromellitic dianhydride, photosensitive polyamide acid ester

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Polyimide from dehydration of polyamide from acid, high molecular weight of polyamide acid is the prerequisite for access to high-performance PI. The main thesis of the polyamide acid ester of polyamide and in the process of influencing factors, that a synthetic polymer of polyamide acid in optimum conditions
Experimental design ideas mainly 4,4, - two-diphenyl ether (ODA), both of benzene Sijia anhydride (PMDA) as Copolymerization of monomer, N-methylpyrrolidone (NMP) as a solvent by changing the Reaction to the conditions of polyamide acid (PAA), and through the IR, the viscosity of the means of product was characterized, the best result by a group of conditions to another through the esterification of photosensitive polyamide Esters (PAE) will be as UV-curable material prepolymers.
3Â¥2008-06-03 21:53:17
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