| 查看: 4135 | 回复: 70 | ||
| 当前只显示满足指定条件的回帖，点击这里查看本话题的所有回帖 | ||
[资源]
一些原子层沉积的综述
|
||
|
Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating reactions between gas phase precursor molecules and a solid surface. The self-limiting nature of the chemical reactions ensures precise film thickness control and excellent step coverage, even on 3D structures with large aspect ratios. At present, ALD is mainly used in the microelectronics industry, e.g. for growing gate oxides. The excellent conformality that can be achieved with ALD also renders it a promising candidate for coating porous structures, e.g. for functionalization of large surface area substrates for catalysis, fuel cells, batteries, supercapacitors, filtration devices, sensors, membranes etc. This tutorial review focuses on the application of ALD for catalyst design. Examples are discussed where ALD of TiO2 is used for tailoring the interior surface of nanoporous films with pore sizes of 4–6 nm, resulting in photocatalytic activity. In still narrower pores, the ability to deposit chemical elements can be exploited to generate catalytic sites. In zeolites, ALD of aluminium species enables the generation of acid catalytic activity. |
回复此楼» 本帖附件资源列表
-
欢迎监督和反馈：小木虫仅提供交流平台，不对该内容负责。
本内容由用户自主发布，如果其内容涉及到知识产权问题，其责任在于用户本人，如对版权有异议，请联系邮箱：xiaomuchong@tal.com - 附件 1 : 一些原子层沉积综述.rar
2014-11-03 00:30:35, 20.04 M
» 猜你喜欢
金属材料论文润色/翻译怎么收费?
已经有154人回复
52楼2016-05-15 21:42:38
简单回复
一维UA2楼
2014-11-03 08:21
回复
五星好评 顶一下，感谢分享！
2014-11-03 08:31
回复
五星好评 顶一下，感谢分享！
林紫4楼
2014-11-03 08:43
回复
五星好评 顶一下，感谢分享！
2014-11-03 08:56
回复
五星好评 顶一下，感谢分享！
zhongz066楼
2014-11-03 09:26
回复
五星好评 顶一下，感谢分享！
wjy20117楼
2014-11-03 09:42
回复
五星好评 顶一下，感谢分享！
zxf9848楼
2014-11-03 10:21
回复
五星好评 顶一下，感谢分享！
2014-11-03 14:59
回复
五星好评 顶一下，感谢分享！
tainanlic10楼
2014-11-03 17:12
回复
顶一下，感谢分享！
jinpengfei11楼
2014-11-03 18:57
回复
五星好评 顶一下，感谢分享！
csuzxc12楼
2014-11-03 22:11
回复
五星好评 顶一下，感谢分享！
kikilq13楼
2014-11-04 00:21
回复
五星好评 顶一下，感谢分享！
zjjxl14楼
2014-11-04 08:39
回复
五星好评 顶一下，感谢分享！