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| L. Chen, S. Shet, H. Tang, H. Wang, T. Deutsch, Y. Yan, J. Turner and M. Al-Jassim, J. Mater. Chem., Vol. 20 (2010): P. 6962. 作为毕业论文的参考文献，其具体格式是什么 |
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http://pubs.rsc.org/en/Content/ArticleLanding/2010/JM/c0jm01228a#!divAbstract Electrochemical deposition of copper oxide nanowires for photoelectrochemical applications Le Chen,*a Sudhakar Shet,a Houwen Tang,a Heli Wang,a Todd Deutsch,a Yanfa Yan,*a John Turnera and Mowafak Al-Jassima Show Affiliations J. Mater. Chem., 2010,20, 6962-6967 DOI: 10.1039/C0JM01228A Received 27 Apr 2010, Accepted 27 May 2010 First published online 09 Jul 2010 Abstract We report a two-step electrochemical process to grow copper oxide nanowires without the use of templates and surfactants. The first step is to electrochemically corrode amorphous Cu–W oxides pre-sputtered on fluorine-doped tin oxide (FTO) coated glass substrates under positive potentials. The second step is to use the corroded samples to grow copper oxide nanowires electrochemically under negative potentials. We find that copper oxide nanowires grown by this method exhibit excellent contact with the FTO-coated substrates leading to good charge transfer. The oxidation states, i.e., CuO or Cu2O, and morphology of nanowires can be controlled by the applied potentials. Cu2O nanowires grown using this method reveal moderate photoelectrochemical response and stability under illumination and under cathodic bias. |
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